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IWAPS 2025 | ​第九届国际先进光刻技术研讨会日程公布
半导体行业观察· 2025-10-01 00:32
第第九九届届国国际际先先进进光光刻刻技技术术研研讨讨会会 (( IIWWAAPPSS 22002255 )) --IIWWAAPPSS 22002255-- 第九届国际先进光刻技术研讨会(IWAPS)将于10月14-15日在深圳隆重举行!本次研 讨会由中国集成电路创新联盟、中国光学学会主办,中国科学院微电子研究所、深圳市半导 体与集成电路产业联盟(深芯盟)、南京诚芯集成电路技术研究院有限公司联合承办,诚邀 全球业界精英共赴这场光刻技术领域的学术盛宴! 国际先进光刻技术研讨会(IWAPS),依托中国创新沃土,搭建全球交流平台。在国内 外光刻专家的鼎力支持下,在全球企业、高校、协会等的共同推动下,IWAPS持续构建覆盖 光刻设备、工艺制程、计量检测、掩模材料、计算光刻、系统协同优化及新型技术等全产业 链的尖端技术对话平台。 本届盛会特别依托深芯盟的产业集群优势,汇聚深圳及湾区半导体企业、高校与科研机 构的协同力量;同时联动湾芯展的产业生态资源,为全球领军企业提供展示创新蓝图的舞 台,为科研院所搭建核心技术攻关的交流通道,为青年学者创造技术思辨的活跃氛围,更为 投资机构提供洞察粤港澳大湾区半导体机遇的前瞻窗口。 第 ...
群贤毕至,共襄盛会——IWAPS 2025诚邀投稿!
半导体行业观察· 2025-06-22 03:23
Core Viewpoint - The 9th International Advanced Lithography Technology Symposium (IWAPS) will be held on October 14-15, 2025, in Shenzhen, aiming to create a global platform for communication and collaboration in the lithography technology field [4]. Group 1: Event Overview - The symposium is organized by the China Integrated Circuit Innovation Alliance and the Chinese Optical Society, with support from various institutions, including the Chinese Academy of Sciences and the Shenzhen Semiconductor and Integrated Circuit Industry Alliance [4]. - IWAPS aims to build a dialogue platform covering the entire lithography industry chain, including equipment, process technology, metrology, mask materials, computational lithography, and new technologies [4]. Group 2: Participation and Submission - Papers submitted to the symposium will be reviewed for inclusion in the SPIE Digital Library and EI [8][12]. - The abstract submission deadline is July 31, 2025, and the full paper submission deadline is September 30, 2025 [11][12]. - Authors are encouraged to submit abstracts that clearly describe the nature, research topics, and significance of their work, with a maximum of 500 words [11]. Group 3: Historical Context - IWAPS has been held annually since its inception, with previous events taking place in various cities, including Beijing, Xiamen, Nanjing, Chengdu, and Lishui [13][20][21][29]. - The symposium has successfully facilitated discussions and advancements in lithography technology over the years, contributing to the growth of the industry [36].