Core Viewpoint - Inverse Lithography Technology (ILT) is emerging as a revolutionary method in chip design, potentially enhancing performance levels significantly, particularly through its application by TSMC and NVIDIA [2][8]. Group 1: Technology Overview - ILT is not a new technology but is being utilized in innovative ways by leading chip manufacturers [2][6]. - The technology addresses issues arising from the diffraction and distortion of extreme ultraviolet light as it passes through complex optical systems in advanced chip manufacturing [4]. - Traditional methods of mask design are iterative and additive, while ILT employs artificial intelligence to generate optical mask images pixel by pixel, resulting in unique and complex designs [5][11]. Group 2: Industry Implications - TSMC's upcoming N2 process (2nm process) will incorporate ILT technology, although it will initially be used for only a few mask layers [8]. - The application of ILT in future GPU products by companies like NVIDIA is expected to yield significant advancements, akin to generational upgrades in chip nodes without the complications of shorter wavelengths [8]. - The resulting lithography masks from ILT are described as visually striking and complex, paralleling the intricate workings of advanced AI models [11].