Workflow
粒子加速器驱动的自由电子激光器 (FEL)
icon
Search documents
EUV光刻,美国实力不容小觑
半导体芯闻· 2025-07-17 10:32
Core Viewpoint - The article discusses the advancements and investments in EUV lithography technology, highlighting the significant role of the United States in this field, particularly through collaborations and new facilities aimed at enhancing semiconductor manufacturing capabilities [1][3][5]. Group 1: US Investments in EUV Technology - The US has launched the CHIPS for America EUV accelerator, establishing a $10 billion partnership with major semiconductor companies to create a next-generation semiconductor research center in Albany, New York [3][5]. - New York State has invested $1 billion to expand the Albany NanoTech Complex, which will include a High NA EUV center, marking it as the first public High NA EUV center in North America [5][6]. - The EUV accelerator will focus on developing advanced High NA EUV technology, which is crucial for producing chips with 7nm and smaller transistors [5][6]. Group 2: Collaboration and Research Environment - The EUV accelerator aims to provide collaborative space and resources for industry, academia, and government partners to drive technological innovation [6][7]. - The facility is expected to enhance the US's technological leadership and support the semiconductor workforce ecosystem [7][8]. Group 3: Alternative Technologies to EUV - US companies are exploring alternative technologies to EUV lithography, such as xLight's particle accelerator-driven free electron lasers (FEL), which aim to produce light more efficiently than current methods [8][9]. - Inversion Semiconductor is developing a "desktop" particle accelerator to generate high-power light, potentially reducing the size of traditional accelerators significantly [11][12]. - Lace Lithography AS from Norway is working on atomic lithography technology that could surpass the resolution limits of EUV, potentially offering lower costs and energy consumption [15][16]. Group 4: Global Efforts in EUV Alternatives - Japanese researchers at KEK are investigating the use of particle accelerators to improve the efficiency and cost-effectiveness of EUV lithography systems [16][18]. - The article emphasizes that while current EUV technology is advancing, there are ongoing efforts globally to explore and develop alternative methods that could redefine semiconductor manufacturing [19].