Core Viewpoint - The article emphasizes the critical role of photoresists in the semiconductor industry, particularly in the lithography process, and highlights the challenges and opportunities in domestic production and innovation in this field [2][3][5]. Group 1: Development and Importance of Photoresists - Photoresists are likened to a "brush" in the semiconductor industry, essential for transferring circuit patterns onto silicon wafers, with advancements in materials directly influencing the continuation of Moore's Law [2][3]. - The evolution of photoresist technology has seen a transition from early DNQ-phenolic resin systems to chemically amplified photoresists and now to metal cluster photoresists for EUV technology, showcasing the need for continuous innovation [2][3]. Group 2: Current Market and Competitive Landscape - The global photoresist market is projected to grow from $10.8 billion in 2024 to $12.5 billion by 2027, with the semiconductor photoresist market expected to reach $2.8 billion by 2027, reflecting a compound annual growth rate of 4% [65]. - The market is dominated by Japanese and American companies, with the top five firms holding 85% of the market share, indicating significant barriers to entry for domestic players [69]. Group 3: Challenges in Domestic Production - The path to domestic production of photoresists is complex, requiring advancements in molecular design, formulation development, and supply chain security, which involves a complete overhaul of capabilities from molecular design to customer validation [3][74]. - Domestic companies are making strides in the photoresist market, with some achieving breakthroughs in specific areas, but they still face significant challenges in high-end markets where competition is fierce [71][74]. Group 4: Technical Aspects and Performance Indicators - The article outlines the technical evolution of photoresists, detailing the importance of wavelength in determining material selection and the mechanisms of various types of photoresists, such as chemically amplified positive and negative photoresists [23][36][44]. - Key performance indicators for photoresists include sensitivity, contrast, resolution, and etch resistance, which are critical for meeting the demands of advanced semiconductor manufacturing processes [59][61]. Group 5: Future Directions and Innovations - The article suggests that the future of photoresist technology will depend on the collaborative evolution of materials, equipment, and processes, emphasizing the need for a systemic approach to overcome existing bottlenecks in the industry [16][87]. - Innovations in photoresist formulations and the development of new materials will be essential to meet the increasing demands for higher resolution and efficiency in semiconductor manufacturing [20][86].

正文 在半导体产业攀登工艺巅峰的征程中，光刻胶作为集成电路图形化工艺的核心媒介，其地位堪比精密绘制蓝图的"画笔"。它不仅决定了电路图案能否被高 保真地转印至硅片，其材料本身的每一次革新—— 从早期的DNQ-酚醛树脂体系，到随KrF、ArF光刻技术而生的化学放大光刻胶，直至面向EUV时代的金 属簇光刻胶 ——都直接推动了摩尔定律的延续。 然而，这项精密且关键的产业，长期以来被少数国际巨头在 材料设计、核心树脂及复杂工艺 诀窍上所构建的壁垒所主导。 国产化之路，因而远非简单的产品替代，而是一场贯穿 基础化学、精密工程与供应链安全的系统性攻坚，涉及从分子设计、配方研发、稳定量产到客户 验证 的全链条能力重塑。 报告将系统性地梳理 半导体光刻胶的技术脉络与产业现状 。报告内容主要涵盖四大方面： 首先 ，回顾光刻胶随光刻技术代演进的 发展历程 ，揭示设备、材料与工艺协同发展的规律； 其次 ，深入剖析成熟制程中主流光刻胶（如248nm、193nm化学放大胶及I线胶）的 工作原理与配方核心 ； 再次 ，明确界定评估光刻胶性能的 关键技术指标 ，解读其背后的设计考量； 点击 最 下方 "在看"和" "并分享，"关注"材料汇 ...