Core Insights - The company has successfully delivered Bestda plasma RF power supplies to leading domestic wafer fabs, marking the first in-situ replacement of RF power supplies for etching equipment in China [2] - The Aspen series plasma RF power supplies and Basalt series matchers have replaced overseas plasma RF power supplies and matchers in CVD (Chemical Vapor Deposition) equipment at major domestic wafer fabs [2]

Core Viewpoint - Hengyun Chang (688785.SH) has successfully delivered Bestda plasma RF power supplies to leading domestic wafer fabs, marking the first in-situ replacement of RF power supplies for etching equipment in China [1] Group 1: Company Developments - The company has achieved a significant milestone by replacing overseas plasma RF power supplies and matching devices in CVD (Chemical Vapor Deposition) equipment with its Aspen series plasma RF power supplies and Basalt series matching devices at major domestic wafer fabs [1]