TWINSCAN NXE:3800E光刻机
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阿斯麦:首台EXE:5200B High NA光刻机已发运
news flash· 2025-07-16 06:33
Core Insights - ASML has shipped its first TWINSCAN EXE:5200B High NA lithography system, indicating progress in the development and application of EUV lithography technology [1] Industry Trends - The investment in lithography machines continues to maintain a strong share of overall investments in wafer fabs, particularly in the DRAM sector [1] - The launch of the TWINSCAN NXE:3800E further solidifies the trend of increasing investment in lithography technology [1]