Core Viewpoint - Lam Research and Tokyo Electron (TEL) are competing for orders from Samsung Electronics for the next-generation 400-layer NAND Flash manufacturing process, having both passed performance evaluations for new technology [2][3] Group 1: Competitive Landscape - Lam Research has successfully completed quality assessments for Samsung's 10th generation NAND Flash (V10) low-temperature etching equipment, which allows for finer circuit patterns [2] - TEL completed its performance evaluation approximately three months prior to Lam Research, receiving Process of Record (POR) approval in April [3] - Both companies are now in a competitive phase for supply, as Samsung is expected to consider both Lam Research and TEL when building production infrastructure for V10 NAND [3] Group 2: Technological Advancements - The low-temperature etching process operates at -60 to -70 degrees Celsius, which is 30 to 40 degrees lower than traditional methods, making it a highly specialized technology [2] - The increase in NAND layers necessitates deeper channel holes with a higher aspect ratio, prompting the need for new processing technologies [2] Group 3: Market Expectations - With the completion of equipment performance evaluations, Samsung is anticipated to initiate procurement orders soon, aiming to establish V10 NAND production lines in the first half of next year [3] - Following trial production, Samsung plans to commence mass production in the latter half of the year [3]