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光刻技术,走下 “神坛”
Tai Mei Ti A P P· 2025-06-24 11:14
Core Viewpoint - The importance of photolithography in semiconductor manufacturing is being questioned, with industry leaders suggesting alternative technologies may reduce reliance on High-NA EUV lithography [1][8]. Group 1: High-NA EUV Lithography - High-NA EUV lithography machines are facing low demand, with many major chip manufacturers hesitant to fully adopt the technology due to high costs and alternative methods being developed [1][3]. - Intel has begun production using ASML's High-NA EUV machines, aiming to leverage this technology for its next-generation manufacturing processes, including Intel 18A (1.8nm) and Intel 14A (1.4nm) [4][6]. - TSMC has stated that it will not adopt High-NA EUV for its A16 (1.6nm) and A14 (1.4nm) processes, indicating that standard EUV machines will suffice until at least 2026 [5][6]. Group 2: Industry Trends and Shifts - Samsung and SK Hynix are delaying the implementation of High-NA EUV in DRAM production due to high costs and upcoming architectural changes in DRAM technology [6][7]. - The focus is shifting towards etching technology, which is becoming increasingly critical in semiconductor manufacturing, especially as advanced processes evolve below 3nm [7][9]. - The industry is exploring new transistor designs that may lessen the dependency on advanced lithography techniques, emphasizing the importance of etching processes instead [7][9]. Group 3: ASML's Market Position - ASML's EUV lithography technology dominates the market, controlling 75% to 80% of the EUV lithography market, contributing significantly to its revenue [10][13]. - In 2024, ASML reported a total of 418 lithography machine sales, including 44 EUV machines, with significant revenue contributions from the Chinese market [10][13]. - ASML is also developing the next generation Hyper NA EUV lithography system, which promises improved performance and efficiency [11][12]. Group 4: Emerging Technologies - New lithography technologies, such as EUV-FEL and atomic lithography, are being researched as potential alternatives to ASML's current EUV systems, which could disrupt the market [14][15][16]. - These emerging technologies aim to provide higher resolution and lower costs, posing a potential threat to ASML's market dominance [15][16].