Core Viewpoint - Guanshi Technology is currently in the sample verification phase for its 40nm photomask, with an overall verification cycle of approximately 6-9 months [2] Group 1: Project Progress - The construction period for the photomask project is set at 60 months, and upon completion, it will have an annual production capacity of 12,450 semiconductor photomasks [2] - The company's professional team possesses extensive technical R&D experience, production management experience, and industry resources in the semiconductor photomask field [2] Group 2: Market Position and Impact - Once the photomask manufacturing project is operational, the company will become a leading independent photomask producer in China, filling the gap in advanced process photomasks domestically and breaking the foreign monopoly on high-end photomasks [2] - The Ningbo photomask project is focused on technology nodes ranging from 350-28nm, primarily targeting 45-28nm, which will accelerate the import substitution process in high-precision, low-line-width semiconductor photomasks [2]

Core Viewpoint - The company has made significant progress in the semiconductor industry with its Ningbo photomask project, which is expected to drive future revenue growth and fill a market gap in high-end photomasks in China [2][3]. Group 1: Project Overview - The Ningbo photomask project has a total investment of 1.6 billion yuan and a designed capacity of 12,450 photomasks per year [2]. - The project commenced in October 2023, with the factory topping out in January 2024, the first electron beam lithography machine delivered in July, and trial production starting in October [2]. - Key breakthroughs are expected by March 2025, with the delivery of 55nm products and the successful operation of a 40nm production line, marking a transition from R&D to mass production [2]. Group 2: Market Impact and Revenue - The project has already begun contributing to revenue, generating over 7 million yuan from January to June 2025 [3]. - As production capacity is gradually released, the project is anticipated to become a significant driver of the company's performance [3]. Group 3: Technological Significance - The semiconductor photomask industry has high technical barriers and complex processes, and the company's team has extensive experience from leading international semiconductor manufacturers [3]. - The advancement of the photomask project is crucial for breaking the foreign monopoly in the high-end photomask sector and enhancing China's semiconductor photomask industry's security and self-sufficiency [3].

Core Viewpoint - The article discusses the current state and future potential of the mask and blank mask industry in China, particularly in the semiconductor and display panel sectors, highlighting the gaps in technology and production capabilities compared to international players [2][3][4]. Industry Overview - The mask plays a crucial role in the production of semiconductors and display panels, with domestic companies primarily focusing on 8.5 generation lines and below, lacking capabilities for high-generation and high-precision masks [2]. - In the semiconductor sector, while some domestic manufacturers can produce masks for 90nm and above processes, only a few can develop products for 65nm and 55nm nodes, indicating significant room for localization in the market for masks below 90nm [2]. Key Players and Product Layout - Major players in the mask industry include: - Qingyi Optoelectronics, which has achieved mass production of 180nm node masks and is developing 130nm-65nm node products [3]. - Huazhong Dishi Microelectronics, aiming for 90nm mass production in 2024 and 40nm by 2025 [4]. - Other notable companies include Longtu Photomask, Jinan Quanyi, and Shanghai Toppan, each focusing on various segments of the mask market [4][5]. Upcoming Events - The 2025 TrendBank (Fifth) Lithography Materials Industry Conference will be held from July 8 to 10 in Hefei, focusing on new applications, trends, and the supply chain in the lithography materials sector [8].