此次团队开发出名为"化学液体沉积"的新工艺，首次实现了在溶液中的硅片上大面积沉积咪唑基金属有 机抗蚀剂，并能以纳米级精度调控涂层厚度。该方法通过调节金属种类与有机分子的组合，灵活调整材 料对特定波长辐射的响应效率。 研究显示，至少有10种金属和数百种有机物可用于构建此类材料体系，为未来优化提供了广阔空间。例 如，锌虽不适用于当前极紫外光刻，却在B-EUV波段表现出优异性能。团队相信，这项技术有望在未 来十年内投入工业应用。（记者张梦然） 为此，美国约翰斯·霍普金斯大学、布鲁克海文国家实验室及劳伦斯伯克利国家实验室，联合中国华东 理工大学、苏州大学，以及瑞士洛桑联邦理工学院共同展开研究，探索使用金属有机材料作为新型抗蚀 剂。这类材料由金属离子（如锌）与有机配体（如咪唑）构成，在B-EUV辐射下能高效吸收光子并产 生电子，从而引发化学变化，精确地在硅片上形成纳米级电路图案。此前研究已证明其潜力，但如何在 晶圆尺度上均匀、可控地沉积此类材料仍是难题。 一个国际联合团队在微芯片制造领域取得关键突破：他们开发出一种新型材料与工艺，可生产出更小、 更快、更低成本的高性能芯片。该研究结合实验与建模手段，为下一代芯片制造奠定 ...

Core Insights - An international collaborative team has achieved a significant breakthrough in microchip manufacturing by developing a new type of material and process that enables the production of smaller, faster, and lower-cost high-performance chips [1][2] - The research combines experimental and modeling techniques, laying the foundation for next-generation chip manufacturing [1] Group 1: Research and Development - The team includes institutions such as Johns Hopkins University, Brookhaven National Laboratory, Lawrence Berkeley National Laboratory, East China University of Science and Technology, Soochow University, and École Polytechnique Fédérale de Lausanne [1] - The focus of the research is on using metal-organic materials as new types of photoresists, which can effectively respond to high-power "beyond extreme ultraviolet" (B-EUV) radiation [1] Group 2: Technological Advancements - The newly developed "chemical liquid deposition" process allows for large-area deposition of imidazole-based metal-organic photoresists on silicon wafers with nanometer-level precision in controlling coating thickness [2] - The method enables flexible adjustment of material response efficiency to specific wavelengths of radiation by varying the combination of metal types and organic molecules [2] Group 3: Future Implications - The research indicates that at least 10 metals and hundreds of organic compounds can be utilized to construct these material systems, providing ample room for future optimization [2] - The team believes that this technology has the potential to be industrially applied within the next decade [2]