Core Viewpoint - The company has launched six new semiconductor equipment products, enhancing its capabilities in plasma etching, atomic layer deposition, and epitaxy, which supports its transformation into a high-end equipment platform company [1][4]. New Product Overview - The company introduced two new etching devices: the Primo UD-RIE for high aspect ratio etching and the Primo Menova for metal etching, both designed to improve efficiency and yield in semiconductor manufacturing [2][3]. - The Primo UD-RIE features advanced technologies such as a dynamic edge impedance adjustment system and a multi-zone temperature control system, enhancing etching precision and equipment reliability [2]. - The Primo Menova is specialized for metal etching, offering excellent etching uniformity and a high throughput, making it suitable for power semiconductors and advanced logic chips [2]. - Four new thin film deposition products were launched, including three atomic layer deposition devices and one epitaxy device, aimed at meeting the needs of advanced logic and storage devices [3][4]. - The Preforma Uniflash series for atomic layer deposition utilizes a dual-reactor design to achieve high production efficiency and excellent film uniformity [3]. - The PRIMIO Epita RP epitaxy device features a unique dual-chamber design, reducing production costs while maintaining high efficiency and adaptability for various semiconductor processes [4]. Impact on the Company - The introduction of these new products is expected to meet the increasing demand for advanced semiconductor technologies, thereby expanding the company's product offerings and enhancing its market position [4]. - The new product line is anticipated to positively influence the company's future growth in the semiconductor equipment market [4].

Core Viewpoint - Company has launched six new semiconductor equipment products, enhancing its product portfolio in plasma etching, atomic layer deposition, and epitaxy technologies, which is expected to positively impact its market expansion and performance growth in the semiconductor equipment sector [2][3]. Group 1: New Product Launch - The new products include two etching devices and four film deposition devices, specifically targeting critical processes in semiconductor manufacturing [2]. - The CCP capacitive high-energy plasma etching machine, Primo UD-RIE, is designed for high aspect ratio etching, featuring six single reaction chamber setups for improved etching precision and production efficiency [2]. - The Primo Menova 12-inch ICP etching device focuses on metal etching, suitable for power semiconductors, memory devices, and advanced logic chip manufacturing [2]. Group 2: Film Deposition Equipment - The four new film deposition products consist of three atomic layer deposition devices and one epitaxy device [3]. - The Preforma Uniflash metal gate series includes TiN, TiAl, and TaN products, catering to advanced logic and storage device applications [3]. - The PRIMIO Epita® RP is a unique dual-chamber low-pressure epitaxy device, notable for its compact reaction chamber design and flexibility in configuration, which reduces production costs and chemical consumption while enhancing production efficiency [3]. Group 3: Company Performance - In the first half of the year, the company reported total revenue of 4.961 billion yuan, representing a year-on-year increase of 43.88% [5]. - The net profit attributable to shareholders reached 706 million yuan, marking a year-on-year growth of 36.62% [5]. - The company is recognized as a leading manufacturer of GaN-based LED equipment and has successfully developed LPCVD and ALD film deposition equipment, with multiple products entering the market and receiving substantial repeat orders [4].

Core Insights - Company announced the launch of six new semiconductor equipment products at CSEAC2025, covering critical processes such as plasma etching, atomic layer deposition (ALD), and epitaxy (EPI) [1] - R&D investment reached 1.492 billion yuan in the first half of 2025, a year-on-year increase of approximately 53.70%, representing about 30.07% of the company's revenue, significantly higher than the average R&D investment level of 10% to 15% for companies listed on the Sci-Tech Innovation Board [1] - The company has over 20 new equipment projects under development, with a significant reduction in development cycle time from 3-5 years to as short as 2 years [1] Product Highlights - Two new etching products were launched, including the CCP capacitive high-energy plasma etching machine Primo UD-RIE, designed for high aspect ratio etching, and the Primo Menova 12-inch ICP single-chamber etching equipment, focused on metal etching applications [2] - The Preforma Uniflash metal gate series in atomic layer deposition includes three products, catering to advanced logic and memory device applications [3] - The PRIMIO Epita RP, the world's first dual-chamber low-pressure epitaxy equipment, features a unique design that reduces production costs and chemical consumption while maintaining high production efficiency [3] Market Position - As a leader in high-end semiconductor equipment manufacturing in China, the company's plasma etching equipment is utilized by top international clients across various advanced integrated circuit production lines, covering 95% of domestic etching application needs [4] - The company has delivered over 6,800 plasma etching and chemical film equipment reaction chambers, achieving mass production and large-scale repeat sales across 155 production lines domestically and internationally [4]