Core Viewpoint - ASML's CEO acknowledges that China has developed domestic lithography equipment, indicating that while there is still a long way to go to catch up with ASML's technology, U.S. measures to suppress China may lead to increased efforts from China to succeed [1] Group 1: Chinese Technological Advancements - The Chinese Academy of Sciences has successfully developed a breakthrough solid-state DUV laser capable of emitting coherent light at 193nm, aligning with the mainstream DUV exposure wavelength, which can advance semiconductor processes to 3nm [1][2] - The developed technology achieves an average laser power of 70mW, a frequency of 6kHz, a linewidth of less than 880MHz, and a full width at half maximum (FWHM) of less than 0.11pm, with spectral purity comparable to existing commercial excimer laser systems [1] Group 2: Comparison with ASML Technology - The solid-state DUV light source technology has been published on the International Society for Optics and Photonics (SPIE) website, showing that while spectral purity is nearly on par with commercial standards, output power and frequency are still significantly lower [4] - Compared to ASML's technology, the frequency achieved is about 2/3, but the output power is only at 0.7% level, indicating that further iterations and improvements are necessary for practical application [4]