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中国有机液体光刻胶行业深度研究及投资前景调研2025~2031年
Sou Hu Cai Jing· 2025-07-17 00:03
Group 1 - The core viewpoint of the article is the in-depth analysis and investment prospects of the organic liquid photoresist industry in China from 2025 to 2031, highlighting market trends, growth opportunities, and competitive landscape [1][3][4]. Group 2 - The organic liquid photoresist market overview includes definitions, classifications, and the statistical scope of the industry [3][4]. - The market is segmented by product types, including positive and negative photoresists, with growth trends projected for 2021, 2025, and 2031 [4][5]. - Applications of organic liquid photoresists are categorized into semiconductor, LCD, printed circuit boards, and others, with growth trends analyzed [4][5]. Group 3 - The current development status of the organic liquid photoresist industry is analyzed, including overall industry characteristics, influencing factors, and entry barriers [4][5][6]. - Global supply and demand dynamics for organic liquid photoresists are forecasted from 2021 to 2031, detailing production capacity, output, and utilization rates [4][5][6]. - China's supply and demand situation is also examined, with projections for production capacity, output, and market demand [4][5][6]. Group 4 - The competitive landscape of the global organic liquid photoresist market is analyzed, including market share of major manufacturers and sales revenue from 2021 to 2025 [4][5][6]. - The report provides insights into the market share and revenue of key players in the Chinese market, along with their sales prices [4][5][6]. Group 5 - Different product types of organic liquid photoresists are analyzed, with sales and revenue trends projected for both global and Chinese markets from 2021 to 2031 [5][6][7]. - The report also discusses the pricing trends of various product types and applications within the organic liquid photoresist market [5][6][7]. Group 6 - The industry development environment is assessed, focusing on trends, driving factors, and a SWOT analysis of Chinese enterprises in the organic liquid photoresist sector [6][7][8]. - The supply chain analysis covers the industry’s procurement, production, and sales models, along with key raw materials and downstream customers [7][8][9]. Group 7 - The report includes profiles of major global manufacturers of organic liquid photoresists, detailing their production bases, market positions, and recent developments [8][9][10]. - It also provides an analysis of the import and export trends of organic liquid photoresists in China, including major sources and destinations [10][11][12].
一份PPT带你看懂光刻胶分类、工艺、成分以及光刻胶市场和痛点
材料汇· 2025-05-25 14:37
Core Viewpoint - The article provides an in-depth analysis of photoresists, focusing on their types, compositions, and the processes involved in their application in semiconductor manufacturing. Group 1: Types of Photoresists - Positive photoresists undergo a decomposition reaction upon exposure to light, resulting in high resolution and good contrast, but they have lower adhesion and higher costs [3][8]. - Negative photoresists form a cross-linked structure upon exposure, which enhances adhesion and etch resistance, but can lead to deformation during development [3][37]. Group 2: Composition of Positive Photoresists - The main component of positive photoresists is phenolic resin, which is soluble in alkaline developers and can be easily cross-linked through thermal reactions [12][35]. - The average molecular weight of the resin typically ranges from 1000 to 3000 g/mole, consisting of 8 to 25 repeating units [17]. Group 3: Development Process - The development process for positive photoresists involves using alkaline developers, which are often based on sodium hydroxide or potassium hydroxide solutions [94]. - The choice of developer is crucial, as it must be compatible with the photoresist to ensure effective development without residue [102][106]. Group 4: Process Conditions - Recommended process conditions for applying photoresists include specific spin speeds and baking temperatures to achieve desired film thickness and uniformity [62][73]. - The article emphasizes the importance of controlling environmental factors such as humidity and temperature during the photoresist application process to avoid defects [78][113]. Group 5: Sensitivity to Environmental Factors - Positive photoresists are particularly sensitive to humidity, which can affect their performance during the development process [25][36]. - The article discusses the impact of temperature on the development rate, highlighting the need for precise control to avoid underdevelopment or overdevelopment [113][116]. Group 6: Conclusion - The article concludes that understanding the properties and processes of photoresists is essential for optimizing semiconductor manufacturing and achieving high-quality results [1][10].