Group 1: Zhaoyi Innovation - Zhaoyi Innovation reported strong growth across various business lines in Q2 2024, with NOR Flash experiencing high single-digit growth, niche DRAM growing over 50%, MCU close to 20%, and sensor chips growing approximately 10% [1] - The company anticipates a quarter-on-quarter growth in Q3, with overall demand expected to rise throughout the year, particularly for niche DRAM, which is facing supply tightness [1] - The overall gross margin is expected to remain stable, with a slight increase in DRAM gross margin and moderate price increases for Flash products [1] - The demand for NOR Flash is driven by an increase in electronic product code volume, while supply constraints are expected to persist due to tight wafer manufacturing capacity [1] - The company is optimistic about customized storage technology, which offers performance advantages, and anticipates more industries and clients will adopt this solution [1] - MCU growth is projected in industrial control, energy storage, and high-end domestic replacement sectors, with new product revenue contributions expected to rise [1] - DDR4 8Gb revenue is expected to contribute one-third of DRAM revenue for the year, while LPDDR4 small-capacity products may see their revenue share increase to double digits [1] - The company has significant R&D investments and a large market potential, aiming to achieve revenue comparable to standard interface niche storage [1] - Zhaoyi Innovation has a first-mover advantage and strong relationships with strategic suppliers, ensuring capacity and process advantages [1] - The niche market remains stable, with production cuts from leading manufacturers creating growth opportunities, and the company plans to launch the LPDDR5 product line within two years [1] - The automotive MCU market is promising, with plans to introduce multi-core products and AI MCUs for AI applications [1] - The 45nm NOR Flash capacity is expected to ramp up, contributing 15% to revenue by year-end, with a complete product line expected by 2026 and a significant cost advantage due to a 20% reduction in chip area [1] Group 2: Aisen Co., Ltd. - Aisen Co., Ltd. has achieved multiple product breakthroughs in wafer, advanced packaging, semiconductor display, and IC substrate fields [2] - The company has successfully mass-produced 28nm process copper plating additives and is testing products in the 5-14nm range [2] - Negative photoresists for glass-based packaging have received mass production orders, and OLED array photoresists have passed validation [2] - Tenting rapid-fill copper plating products have been introduced into the HDI and SLP supply chains [2] - The TSV process relies on high-precision copper plating, and the company's TSV copper plating additives have achieved rapid, void-free filling [2] - Aisen has developed its own photoresist resin covering various types, forming a complete R&D system [2] - The IC substrate market is projected to reach $31 billion by 2030, with the company's copper plating products gradually being pushed into HDI, SLP, and IC substrate applications to increase localization rates [2]

Core Insights - Jiangsu Province's Ministry of Industry and Information Technology has released the first batch of new material recognition results for 2025, selecting 33 new material products across the province, with Suzhou leading with 7 products [1] - These products are widely used in sectors such as semiconductors, high-end equipment, and new energy [1] - This is the first time Jiangsu has conducted such recognition work, aimed at addressing the development bottlenecks in the new materials industry [1] New Material Recognition - The first batch of new materials refers to products that have achieved original innovation or significant technological breakthroughs, possess independent intellectual property rights, and are in the early market application stage [1] - The recognition aims to overcome the challenges of "no materials available, poor quality materials, and reluctance to use good materials" in the new materials industry [1] Company Highlight - Aisen Co., Ltd. from Kunshan has produced a negative photoresist that is among the recognized products, targeting a critical aspect of chip manufacturing [1] - The company has developed a high-performance thick film negative photoresist for copper bumps, overcoming previous technical challenges such as poor uniformity, undesirable morphology, and low durability [1]

Group 1 - The core viewpoint of the article is the in-depth analysis and investment prospects of the organic liquid photoresist industry in China from 2025 to 2031, highlighting market trends, growth opportunities, and competitive landscape [1][3][4]. Group 2 - The organic liquid photoresist market overview includes definitions, classifications, and the statistical scope of the industry [3][4]. - The market is segmented by product types, including positive and negative photoresists, with growth trends projected for 2021, 2025, and 2031 [4][5]. - Applications of organic liquid photoresists are categorized into semiconductor, LCD, printed circuit boards, and others, with growth trends analyzed [4][5]. Group 3 - The current development status of the organic liquid photoresist industry is analyzed, including overall industry characteristics, influencing factors, and entry barriers [4][5][6]. - Global supply and demand dynamics for organic liquid photoresists are forecasted from 2021 to 2031, detailing production capacity, output, and utilization rates [4][5][6]. - China's supply and demand situation is also examined, with projections for production capacity, output, and market demand [4][5][6]. Group 4 - The competitive landscape of the global organic liquid photoresist market is analyzed, including market share of major manufacturers and sales revenue from 2021 to 2025 [4][5][6]. - The report provides insights into the market share and revenue of key players in the Chinese market, along with their sales prices [4][5][6]. Group 5 - Different product types of organic liquid photoresists are analyzed, with sales and revenue trends projected for both global and Chinese markets from 2021 to 2031 [5][6][7]. - The report also discusses the pricing trends of various product types and applications within the organic liquid photoresist market [5][6][7]. Group 6 - The industry development environment is assessed, focusing on trends, driving factors, and a SWOT analysis of Chinese enterprises in the organic liquid photoresist sector [6][7][8]. - The supply chain analysis covers the industry’s procurement, production, and sales models, along with key raw materials and downstream customers [7][8][9]. Group 7 - The report includes profiles of major global manufacturers of organic liquid photoresists, detailing their production bases, market positions, and recent developments [8][9][10]. - It also provides an analysis of the import and export trends of organic liquid photoresists in China, including major sources and destinations [10][11][12].

Core Viewpoint - The article provides an in-depth analysis of photoresists, focusing on their types, compositions, and the processes involved in their application in semiconductor manufacturing. Group 1: Types of Photoresists - Positive photoresists undergo a decomposition reaction upon exposure to light, resulting in high resolution and good contrast, but they have lower adhesion and higher costs [3][8]. - Negative photoresists form a cross-linked structure upon exposure, which enhances adhesion and etch resistance, but can lead to deformation during development [3][37]. Group 2: Composition of Positive Photoresists - The main component of positive photoresists is phenolic resin, which is soluble in alkaline developers and can be easily cross-linked through thermal reactions [12][35]. - The average molecular weight of the resin typically ranges from 1000 to 3000 g/mole, consisting of 8 to 25 repeating units [17]. Group 3: Development Process - The development process for positive photoresists involves using alkaline developers, which are often based on sodium hydroxide or potassium hydroxide solutions [94]. - The choice of developer is crucial, as it must be compatible with the photoresist to ensure effective development without residue [102][106]. Group 4: Process Conditions - Recommended process conditions for applying photoresists include specific spin speeds and baking temperatures to achieve desired film thickness and uniformity [62][73]. - The article emphasizes the importance of controlling environmental factors such as humidity and temperature during the photoresist application process to avoid defects [78][113]. Group 5: Sensitivity to Environmental Factors - Positive photoresists are particularly sensitive to humidity, which can affect their performance during the development process [25][36]. - The article discusses the impact of temperature on the development rate, highlighting the need for precise control to avoid underdevelopment or overdevelopment [113][116]. Group 6: Conclusion - The article concludes that understanding the properties and processes of photoresists is essential for optimizing semiconductor manufacturing and achieving high-quality results [1][10].