Core Viewpoint - The successful launch of China's first commercial electron beam lithography machine "Xizhi" marks a significant breakthrough in quantum chip research, achieving a precision of 0.6 nanometers and a line width of 8 nanometers, thus breaking international restrictions on technology procurement [1][4][5]. Technological Breakthrough and Application Value - The "Xizhi" machine, developed by Zhejiang University’s Quantum Research Institute, operates at 100kV and is currently undergoing testing by teams from the University of Science and Technology of China and Zhejiang University [4]. - The development team likens "Xizhi" to a "nano brush" capable of intricately etching circuit designs on silicon substrates, enhancing the efficiency of chip design modifications without the need for traditional photomasks [5]. - The introduction of "Xizhi" addresses the long-standing issue of international export controls that have hindered domestic research and development in advanced semiconductor technologies, thus opening new market opportunities for companies like Huawei HiSilicon [5][6]. Collaborative Innovation Mechanism - The success of the "Xizhi" machine is part of a broader initiative combining technological and industrial innovation, facilitated by a collaborative framework involving Zhejiang University and local government [6]. - Although electron beam lithography currently has lower production efficiency compared to EUV lithography, its unique advantages in quantum chip development are irreplaceable, positioning "Xizhi" as a critical asset for advancing China's high-end semiconductor capabilities [6].

Core Viewpoint - The article highlights the successful development and testing of China's first domestically produced commercial electron beam lithography machine, named "Xizhi," which aims to enhance the country's semiconductor industry and reduce reliance on foreign technology [2][4]. Group 1: Product Development - The "Xizhi" is a next-generation 100kV electron beam lithography machine, designed for quantum chips and new semiconductor research, achieving a precision of 0.6 nanometers and a line width of only 8 nanometers, comparable to international mainstream equipment [4]. - Unlike traditional lithography machines, the electron beam lithography machine offers unique advantages in prototype design, rapid iteration, and small batch production, significantly improving the efficiency of early-stage chip development [4]. Group 2: Market Impact - The introduction of "Xizhi" breaks the long-standing export control barriers that prevented domestic research institutions and enterprises from acquiring advanced electron beam lithography equipment, facilitating collaboration with various domestic companies and research institutions [4].