Core Viewpoint - Longtu Photomask indicates that while multiple exposure technology theoretically supports advanced chip processes, the potential costs and technical difficulties for wafer fabs are significant [1] Group 1: Technology and Production - The company has completed the production equipment layout for the 40nm process node and is actively advancing the sampling of 65nm products and the mass production of 90nm node products [1] - The mask process node (e.g., "40nm mask") does not directly refer to the minimum physical linewidth of its graphics but indicates its capability to stably support downstream wafer fabs in chip manufacturing [1] Group 2: Capacity and Market Development - The Zhuhai fundraising project is set to begin small-scale production in the second quarter of 2025, currently in a critical phase of capacity ramp-up and market expansion [1] - The company is focused on accelerating capacity utilization and deepening collaboration with customers [1]

Core Viewpoint - Longtu Photomask (688721.SH) has confirmed that multi-exposure technology theoretically supports advanced chip manufacturing processes, but the associated costs and technical difficulties are significant [1] Group 1: Technology and Production - The company has completed the production equipment layout for the 40nm process node and is actively advancing the sampling of 65nm products and the mass production of 90nm node products [1] - The term "40nm photomask" refers to the stable support it provides for downstream wafer fabs rather than the minimum physical linewidth of its own patterns [1] Group 2: Capacity and Market Development - The Zhuhai fundraising project is set to begin small-scale production in the second quarter of 2025, currently in a critical phase of capacity ramp-up and market expansion [1] - The company is focused on accelerating capacity utilization and deepening collaboration with customers [1]