Core Viewpoint - Longtu Photomask has outlined its certification process, which typically takes 6-12 months or longer, depending on the complexity of the manufacturing process [1] Group 1: Certification Process - The certification process includes several stages: signing NDA agreements, evaluating information security systems, assessing manufacturing capabilities and precision indicators, verifying process and measurement method compatibility, confirming data processing, evaluating samples, and conducting wafer testing [1] - The higher the manufacturing process level, the stricter and longer the certification period [1] Group 2: Product Development Status - Longtu Photomask has successfully transitioned its 90nm products from research and development to mass production [1] - The 65nm products are currently in the customer validation phase [1]

Core Viewpoint - Longtu Photomask (688721.SH) has outlined its certification process, which typically takes 6-12 months or longer, depending on the complexity of the manufacturing process [1] Group 1: Certification Process - The certification process includes signing NDA agreements, assessing information security systems, evaluating manufacturing capabilities and precision metrics, verifying process and measurement method compatibility, confirming data processing, and testing samples [1] - The higher the manufacturing process level, the stricter and longer the certification period [1] Group 2: Product Development Status - The company has successfully transitioned its 90nm products from research and development to mass production [1] - The 65nm products are currently in the customer validation phase [1]

Core Viewpoint - Longtu Photomask indicates that while multiple exposure technology theoretically supports advanced chip processes, the potential costs and technical difficulties for wafer fabs are significant [1] Group 1: Technology and Production - The company has completed the production equipment layout for the 40nm process node and is actively advancing the sampling of 65nm products and the mass production of 90nm node products [1] - The mask process node (e.g., "40nm mask") does not directly refer to the minimum physical linewidth of its graphics but indicates its capability to stably support downstream wafer fabs in chip manufacturing [1] Group 2: Capacity and Market Development - The Zhuhai fundraising project is set to begin small-scale production in the second quarter of 2025, currently in a critical phase of capacity ramp-up and market expansion [1] - The company is focused on accelerating capacity utilization and deepening collaboration with customers [1]

Core Viewpoint - Longtu Photomask (688721.SH) has confirmed that multi-exposure technology theoretically supports advanced chip manufacturing processes, but the associated costs and technical difficulties are significant [1] Group 1: Technology and Production - The company has completed the production equipment layout for the 40nm process node and is actively advancing the sampling of 65nm products and the mass production of 90nm node products [1] - The term "40nm photomask" refers to the stable support it provides for downstream wafer fabs rather than the minimum physical linewidth of its own patterns [1] Group 2: Capacity and Market Development - The Zhuhai fundraising project is set to begin small-scale production in the second quarter of 2025, currently in a critical phase of capacity ramp-up and market expansion [1] - The company is focused on accelerating capacity utilization and deepening collaboration with customers [1]