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江化微: 江阴江化微电子材料股份有限公司2025年度以简易程序向特定对象发行A股股票募集资金使用可行性分析报告
Zheng Quan Zhi Xing· 2025-08-22 10:18
Core Viewpoint - Jiangyin Jianghua Microelectronics Materials Co., Ltd. plans to raise funds through a simplified procedure for the issuance of A-shares to enhance its capital strength and profitability, with a total fundraising amount not exceeding 300 million yuan [1][17]. Fundraising Plan - The total amount of funds raised will not exceed 30,000.00 thousand yuan, and the net amount after deducting issuance costs will be fully invested in specific projects [2]. - The company may use self-raised funds for project progress before the fundraising is completed and will replace these with raised funds once available [2]. Investment Project Details - The main project involves an annual production capacity of 37,000 tons of ultra-pure wet electronic chemicals, with a total investment of 288,827.9 thousand yuan [2][3]. - The project will be implemented by Jianghua Micro (Zhenjiang) Electronic Materials Co., Ltd. and is located in the Zhenjiang New District Green Chemical New Materials Industrial Park [2][3]. Industry Context - The semiconductor industry is a strategic and foundational sector for national economic development, with a global market size projected to grow from $515 billion in 2023 to $1.3 trillion by 2032, reflecting a compound annual growth rate of approximately 10% [3]. - The Asia-Pacific region holds 60% of the global semiconductor market share, with China being the largest market, accounting for nearly 40% [3]. Market Demand and Growth - The demand for wet electronic chemicals is expected to grow significantly, with the Chinese semiconductor wet chemical market projected to reach 7.93 billion yuan in 2024, a year-on-year increase of 9.9% [11]. - The company has established a strong customer base in the semiconductor, display, and solar energy sectors, including notable clients such as Silan Microelectronics and BOE Technology Group [12]. Competitive Advantage - The company is one of the leading domestic enterprises in the wet electronic chemicals industry, focusing on R&D, production, and sales, with a complete production process for high-purity wet electronic chemicals [7][14]. - The company has a professional R&D team of 118 people and has developed production formulas that meet international standards, holding 147 patents, including 56 invention patents [14]. Strategic Alignment - The project aligns with national industrial policies and the company's strategic development direction, providing a favorable market development outlook and economic benefits [16][17]. - The implementation of the fundraising project is expected to enhance the company's profitability and core competitiveness, positioning it as a leading provider of electronic chemicals [8][17].
一份PPT带你看懂光刻胶分类、工艺、成分以及光刻胶市场和痛点
材料汇· 2025-05-25 14:37
Core Viewpoint - The article provides an in-depth analysis of photoresists, focusing on their types, compositions, and the processes involved in their application in semiconductor manufacturing. Group 1: Types of Photoresists - Positive photoresists undergo a decomposition reaction upon exposure to light, resulting in high resolution and good contrast, but they have lower adhesion and higher costs [3][8]. - Negative photoresists form a cross-linked structure upon exposure, which enhances adhesion and etch resistance, but can lead to deformation during development [3][37]. Group 2: Composition of Positive Photoresists - The main component of positive photoresists is phenolic resin, which is soluble in alkaline developers and can be easily cross-linked through thermal reactions [12][35]. - The average molecular weight of the resin typically ranges from 1000 to 3000 g/mole, consisting of 8 to 25 repeating units [17]. Group 3: Development Process - The development process for positive photoresists involves using alkaline developers, which are often based on sodium hydroxide or potassium hydroxide solutions [94]. - The choice of developer is crucial, as it must be compatible with the photoresist to ensure effective development without residue [102][106]. Group 4: Process Conditions - Recommended process conditions for applying photoresists include specific spin speeds and baking temperatures to achieve desired film thickness and uniformity [62][73]. - The article emphasizes the importance of controlling environmental factors such as humidity and temperature during the photoresist application process to avoid defects [78][113]. Group 5: Sensitivity to Environmental Factors - Positive photoresists are particularly sensitive to humidity, which can affect their performance during the development process [25][36]. - The article discusses the impact of temperature on the development rate, highlighting the need for precise control to avoid underdevelopment or overdevelopment [113][116]. Group 6: Conclusion - The article concludes that understanding the properties and processes of photoresists is essential for optimizing semiconductor manufacturing and achieving high-quality results [1][10].