股票代码：603078 股票简称：江化微 江阴江化微电子材料股份有限公司 （江苏省江阴市周庄镇长寿云顾路 581 号） 江阴江化微电子材料股份有限公司 募集资金使用可行性分析报告 二〇二五年八月 江阴江化微电子材料股份有限公司 以简易程序向特定对象发行 A 股股票募集资金使用可行性 分析报告 江阴江化微电子材料股份有限公司（以下简称"江化微"或"公司"）是在上海证 券交易所主板上市的公司。为满足公司业务发展的需要，扩大公司经营规模，进一步增 强公司资本实力及盈利能力，公司根据《中华人民共和国公司法》《中华人民共和国证 券法》《上市公司证券发行注册管理办法》等相关法律、法规和规范性文件的规定，拟 通过以简易程序向特定对象发行A股股票方式募集资金。公司就本次发行募集资金使用 的可行性分析如下： 一、本次募集资金使用计划 本次发行募集资金总额不超过30,000.00万元（含30,000.00万元），扣除发行费用后 的募集资金净额全部投资于以下项目： 单位：万元 | 序号 | 项目名称 | 项目投资总额 | | 拟使用募集资金 | | --- | --- | --- | --- | --- | | | 合计 | 30 ...

Core Viewpoint - The article provides an in-depth analysis of photoresists, focusing on their types, compositions, and the processes involved in their application in semiconductor manufacturing. Group 1: Types of Photoresists - Positive photoresists undergo a decomposition reaction upon exposure to light, resulting in high resolution and good contrast, but they have lower adhesion and higher costs [3][8]. - Negative photoresists form a cross-linked structure upon exposure, which enhances adhesion and etch resistance, but can lead to deformation during development [3][37]. Group 2: Composition of Positive Photoresists - The main component of positive photoresists is phenolic resin, which is soluble in alkaline developers and can be easily cross-linked through thermal reactions [12][35]. - The average molecular weight of the resin typically ranges from 1000 to 3000 g/mole, consisting of 8 to 25 repeating units [17]. Group 3: Development Process - The development process for positive photoresists involves using alkaline developers, which are often based on sodium hydroxide or potassium hydroxide solutions [94]. - The choice of developer is crucial, as it must be compatible with the photoresist to ensure effective development without residue [102][106]. Group 4: Process Conditions - Recommended process conditions for applying photoresists include specific spin speeds and baking temperatures to achieve desired film thickness and uniformity [62][73]. - The article emphasizes the importance of controlling environmental factors such as humidity and temperature during the photoresist application process to avoid defects [78][113]. Group 5: Sensitivity to Environmental Factors - Positive photoresists are particularly sensitive to humidity, which can affect their performance during the development process [25][36]. - The article discusses the impact of temperature on the development rate, highlighting the need for precise control to avoid underdevelopment or overdevelopment [113][116]. Group 6: Conclusion - The article concludes that understanding the properties and processes of photoresists is essential for optimizing semiconductor manufacturing and achieving high-quality results [1][10].