Core Viewpoint - The article discusses the critical role of photolithography materials in semiconductor manufacturing, highlighting their importance in determining chip performance, integration, and production costs, as well as the ongoing innovation and upgrades in these materials due to evolving technological requirements [2][31]. Group 1: Photolithography Materials Overview - Photolithography materials are essential in the photolithography process, which transfers patterns from masks to substrates, playing a crucial role in integrated circuit manufacturing [3][5]. - Key components of photolithography materials include SOC (Spin On Carbon), anti-reflective coatings (BARC and TARC), photoresists, adhesion promoters, top coatings, diluents, and developers [3][5][19]. Group 2: Market Growth and Trends - The domestic integrated circuit key materials market is projected to grow from CNY 66.47 billion in 2019 to CNY 113.93 billion in 2023, with a compound annual growth rate (CAGR) of 14.4%, and is expected to reach CNY 258.96 billion by 2028 [31][32]. - The domestic photolithography materials market is anticipated to grow from CNY 5.37 billion in 2019 to CNY 12.19 billion in 2023, with a CAGR of 22.7%, and is projected to reach CNY 31.92 billion by 2028 [39]. Group 3: Specific Material Insights - SOC is a foundational material in photolithography, providing excellent anti-reflective properties and etch resistance, with its usage expected to increase significantly due to the complexity of wafer manufacturing processes [7][40]. - BARC serves as a barrier in the photolithography process, effectively reducing interference from reflected light, and its market share is expected to grow alongside advancements in integrated circuit technology [12][45]. - TARC functions as a top anti-reflective coating, enhancing exposure stability and accuracy by controlling light reflection during the photolithography process [17][18]. Group 4: Competitive Landscape - Major global players in the photolithography materials market include DuPont, Shin-Etsu Chemical, and Brewer Science, which dominate due to their technological expertise and comprehensive product offerings [54][55]. - The domestic market is gradually increasing its share, with local companies enhancing their R&D capabilities and production levels, although foreign firms still hold a significant market share in advanced processes [39][54].

Core Viewpoint - The 2025 TrendBank Photolithography Industry Conference held in Hefei focused on advanced photolithography technologies and the current state of domestic photolithography materials, discussing innovation and industry upgrades to enhance self-sufficiency and quality levels in China [1][2]. Group 1: Conference Highlights - The conference covered cutting-edge photolithography technologies such as EUV, electron beam lithography, and nanoimprint lithography, along with the latest research progress and application prospects [1]. - Key discussions included the domestic production status and technical bottlenecks of photolithography materials like photoresists, wet electronic chemicals, and masks [1]. - The conference emphasized the importance of breaking barriers and fostering collaboration in the development of domestic photolithography equipment [12]. Group 2: Industry Developments - The domestic photolithography chemical materials industry is developing a complete supply chain, with significant production capacities established, including 4,000 tons/year for display photoresists and 500 tons/year for semiconductor photoresists [14]. - Research on trace gases under DUV light is complex, requiring precise detection methods and monitoring setups to study potential chemical reactions [16]. - Digital lithography, particularly laser direct-write lithography, is gaining traction in specific fields, with optimistic market prospects expected to mature over the next three years [20]. Group 3: Technical Challenges - The application of excimer laser gas technology faces challenges such as gas mixing, impurity removal, and product testing, despite its advantages in resolution and production efficiency [22]. - Trace cations and anions significantly impact downstream products, with various sources of contamination identified [24].