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高数值孔径EUV光刻技术
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EUV光刻,新里程碑
半导体行业观察· 2025-09-23 01:08
从左至右:20nm 间距线结构,11nm 和 13nm 尖到尖 CD,以及 18nm 间距和 16nm 尖到尖。 它一直与光刻设备公司 AMSL 合作。 公众号记得加星标⭐️,第一时间看推送不会错过。 比利时研究实验室 Imec 在加利福尼亚州蒙特雷举行的"SPIE 光掩模技术 + EUV 光刻"会议上展示了 单次印刷高数值孔径 EUV 光刻技术的进展: " 我 们 实 现 了 20 纳 米 和 18 纳 米 间 距 的 钌 线 , 包 括 15 纳 米 的 尖 端 结 构 和 低 电 阻 功 能 互 连 , "Imec 表 示。"对于20纳米间距的金属化线结构,获得了100%的电气测试良率。" 该成果部分由欧盟的"NanoIC"试验线实现,并将在会议论文 13686-4"干光刻胶在High NAEUV 光 刻中向下一代线空间图案化的进展"中发表。 Imec 规模化副总裁 Steven Scheer 表示:"ASML-imec 高数值孔径 EUV 联合实验室在费尔德霍芬 正式启用后,imec 及其合作伙伴生态系统在推动光刻技术发展和推动行业迈入埃时代方面取得了长 足进步。此次展示的成果标志着一个新的里程碑,彰 ...
EUV光刻机,又一重磅宣布
半导体行业观察· 2025-03-23 04:03
Core Viewpoint - The strategic partnership agreement between Imec and Zeiss Semiconductor Manufacturing Technology aims to advance semiconductor technology development, particularly for research and development below 2 nanometers, extending their collaboration until 2029 [3][7]. Group 1: Partnership Details - The new agreement extends the existing partnership established in 2019, emphasizing the importance of collaboration in advancing semiconductor technology [3]. - Imec and Zeiss have been working together since 1997 on various joint projects to further develop Moore's Law, which continues to enhance microchip and memory processor performance [3][5]. - The partnership focuses on key semiconductor manufacturing technologies, including high numerical aperture EUV lithography, which is essential for producing more powerful and energy-efficient microchips [3][5]. Group 2: Technological Advancements - Imec's NanoIC pilot line is being expanded to cover the entire value creation process and various technology chains in semiconductor manufacturing [5]. - The pilot line aims to provide groundbreaking and advanced semiconductor technologies and platforms for industry representatives, enabling them to explore, develop, and test innovations [5]. - Both companies are committed to optimizing existing equipment, processes, and measurement methods to achieve smaller, more powerful, and energy-efficient microchips, driving global digitalization [5][8]. Group 3: European Chip Act Compliance - The collaboration aligns with the goals of the European Chip Act, which aims to strengthen Europe's technological sovereignty, competitiveness, and resilience [7]. - Zeiss's investment in the NanoIC pilot line contributes significantly to maintaining Europe's leadership in the latest generation of semiconductor equipment [7]. - The partnership highlights the strong cohesion among European partners, which is crucial for establishing the NanoIC pilot line, recognized as the world's most advanced R&D infrastructure below 2 nanometers [8].