每经头条（nbdtoutiao）——申请超2万份，已开出41家，加盟海底捞，你要准备多少钱？1000万元不算 多，真实"账单"公布 （记者 张喜威） 截至发稿，有研新材市值为193亿元。 每经AI快讯，有研新材（SH 600206，收盘价：22.75元）8月29日晚间发布公告称，公司第九届第十六 次董事会会议于2025年8月29日在公司会议室以通讯会议方式召开。会议审议了《有研新材2025年半年 度报告及摘要》等文件。 2024年1至12月份，有研新材的营业收入构成为：电子新材料占比74.79%，稀土金属冶炼占比23.86%， 医疗器械材料占比0.87%，其他业务占比0.47%。 ...

本公司监事会及全体监事保证本公告内容不存在任何虚假记载、误导性陈 述或者重大遗漏，并对其内容的真实性、准确性和完整性承担个别及连带责任。 一、监事会会议召开情况 有研新材料股份有限公司（以下简称"有研新材"或"公司"）第九届监事 会第九次会议通知和材料于 2025 年 8 月 19 日以书面方式发出。会议于 2025 年 8 月 29 日在公司会议室以通讯会议方式召开。会议应到监事 3 名，实到监事 3 名。会议由监事会主席刘慧舟先生主持。公司董事、高级管理人员列席本次会议。 本次会议符合《中华人民共和国公司法》及《有研新材料股份有限公司章程》的 规定，会议合法有效。 证券代码：600206 证券简称：有研新材 编号：2025-050 有研新材料股份有限公司 第九届监事会第九次会议决议公告 监事会认为：公司 2025 年半年度报告的编制和审议程序符合法律、法规、 公司章程和公司内部管理制度的各项规定，报告的内容和格式符合中国证监会和 上海证券交易所的相关规定，所披露的信息真实地反映了公司经营管理和财务状 况。编制 2025 年半年度报告期间，未发现参与报告编制和审议人员有违反内幕 信息管理规定的行为。 表决情 ...

证券代码：600206 证券简称：有研新材 公告编号：2025-049 有研新材料股份有限公司 第九届董事会第十六次会议决议公告 本公司董事会及全体董事保证本公告内容不存在任何虚假记载、误导性陈 述或者重大遗漏，并对其内容的真实性、准确性和完整性承担个别及连带责任。 一、董事会会议召开情况 有研新材料股份有限公司（以下简称"有研新材"或"公司"）第九届董事会第 十六次会议通知和材料于 2025 年 8 月 19 日以书面方式发出。会议于 2025 年 8 月 29 日在公司会议室以通讯会议方式召开。会议应到董事 7 名，实到董事 7 名。会议由 公司董事长艾磊先生主持。公司监事、高级管理人员列席本次会议。本次会议符合 《公司法》及《公司章程》的规定，会议合法有效。 二、董事会会议审议情况 1、审议通过《有研新材 2025 年半年度报告及摘要》 有研新材料股份有限公司 2025 年半年度报告及摘要的具体内容详见 2025 年 8 月 30 日的《上海证券报》、《证券日报》和上海证券交易所网站（www.sse.com.cn）。 4、审议通过《关于有研新材任期（2021-2024 年）组织绩效考核指标完成情况 的议 ...

每经AI快讯，8月29日，有研新材(600206.SH)公告称，上半年实现营业收入40.96亿元，同比下降 9.76%；归属于上市公司股东的净利润1.30亿元，同比增长218.47%。 （文章来源：每日经济新闻） ...

智通财经APP讯，有研新材(600206.SH)发布2025年半年度报告，报告期内，公司实现营业收入40.96亿 元，同比下降9.76%。实现归属于上市公司股东的净利润1.3亿元，同比增长218.47%。实现归属于上市 公司股东的扣除非经常性损益的净利润1.22亿元，同比增长327.61%。基本每股收益0.154元。 ...

有研新材料股份有限公司2025 年半年度报告摘要 公司代码：600206 公司简称：有研新材 有研新材料股份有限公司 2025 年半年度报告摘要 有研新材料股份有限公司2025 年半年度报告摘要 第一节 重要提示 1.1 本半年度报告摘要来自半年度报告全文，为全面了解本公司的经营成果、财务状况及未来发 展规划，投资者应当到 www.sse.com.cn 网站仔细阅读半年度报告全文。 1.2 本公司董事会、监事会及董事、监事、高级管理人员保证半年度报告内容的真实性、准确性、 完整性，不存在虚假记载、误导性陈述或重大遗漏，并承担个别和连带的法律责任。 1.4 本半年度报告未经审计。 1.3 公司全体董事出席董事会会议。 1.5 董事会决议通过的本报告期利润分配预案或公积金转增股本预案 | 联系人和联系方式 | 董事会秘书 | 证券事务代表 | | --- | --- | --- | | 姓名 | 杨阳 | 闫缓 | | 电话 | 010-62369559 | 010-62023601 | | 办公地址 | 北京市西城区新街口外大街2 | 北京市西城区新街口外大街2 | | | 号D座有研科技创新中心18层 | 号 ...

有研新材8月29日披露半年报，公司上半年实现营业收入40.96亿元，同比下降9.76%；归属于上市公司 股东的净利润1.3亿元，同比增长218.47%；基本每股收益0.154元/股。 ...

Core Insights - The A-share military industry stocks have shown strong performance, with notable increases in share prices for several companies [1] Group 1: Stock Performance - Aerospace Hongtu (航天宏图) increased by 17.97%, with a total market capitalization of 10.1 billion and a year-to-date increase of 89.85% [2] - Jiezhong Technology (捷众科技) rose by 15.01%, with a market cap of 2.307 billion and a year-to-date increase of 97.39% [2] - North Long Dragon (北方长龙) saw a 13.83% increase, with a market cap of 16.5 billion and a staggering year-to-date increase of 419.86% [2] - Tianwo Technology (天沃科技) increased by 10.06%, with a market cap of 7.893 billion and a year-to-date increase of 106.52% [2] - Jianghai Co., Ltd. (江海股份) rose by 10.01%, with a market cap of 28.3 billion and a year-to-date increase of 92.12% [2] - Other notable performers include Zhehai De Man (浙海德曼) and Xing Sen Technology (兴森科技), both showing increases of over 7% [1][2]

截至8月27日收盘，稀土永磁概念上涨0.10%，位居概念板块涨幅第4，板块内，26股上涨，北矿科技涨 停，大地熊、北方稀土、立中集团等涨幅居前，分别上涨10.36%、8.86%、7.07%。跌幅居前的有科隆 股份、瑞晨环保、金田股份等，分别下跌5.65%、5.63%、5.05%。 | 300127 | 银河磁 | 3.61 | 17.14 | 7587.54 | 5.71 | | --- | --- | --- | --- | --- | --- | | | 体 | | | | | | 002057 | 中钢天 | 4.38 | 17.64 | 6215.97 | 4.06 | | | 源 | | | | | | 600549 | 厦门钨 | 1.20 | 6.72 | 6086.97 | 2.01 | | | 业 | | | | | | 600366 | 宁波韵 升 | 0.00 | 12.79 | 5918.50 | 2.57 | | 300631 | 久吾高 | 1.08 | 14.43 | 3410.83 | 5.51 | | | 科 | | | | | | 000969 | 安泰科 技 | 0.07 ...

Core Viewpoint - The semiconductor sputtering target materials industry, often overlooked, is crucial for the semiconductor supply chain, with significant investment potential as domestic alternatives emerge to replace long-standing foreign monopolies [2][4]. Industry Overview: What are Sputtering Target Materials? - Sputtering target materials are essential for physical vapor deposition (PVD) processes, creating functional thin films on substrates like silicon wafers through magnetron sputtering technology [6][8]. - These materials are critical for manufacturing integrated circuits, specifically in metal interconnect layers, barrier layers, and contact layers, requiring ultra-high purity (typically above 99.9995%) and precise dimensions [8][12]. Classification of Targets - Targets are categorized by material type: metal targets (e.g., copper, aluminum), alloy targets (e.g., copper-manganese), and ceramic targets (e.g., indium tin oxide) [12][10]. - Each type serves specific functions in semiconductor applications, with increasing purity and structural uniformity requirements as technology advances [12][13]. Upstream Supply: High-Purity Metals and Equipment - The upstream supply involves high-purity metal and non-metal raw materials, with significant reliance on imports for high-purity materials [15][16]. - Key domestic producers include Xinjiang Zhonghe for aluminum and Jiangfeng Electronics for tungsten, while global leaders include Hydro for high-purity aluminum and Hitachi Metals for tungsten [16][15]. Midstream Manufacturing: Technically Intensive Core Segment - The midstream segment encompasses the manufacturing of sputtering targets, involving complex processes such as melting, forming, and binding, requiring significant R&D investment [18][17]. - Precision in temperature, time, and atmosphere during melting is crucial for ensuring material uniformity and purity [18]. Downstream Coating: Sputter Coating - The main coating processes include PVD and chemical vapor deposition (CVD), with PVD being the predominant method in semiconductor and display applications [19][21]. - The sputtering coating market is largely dominated by American and Japanese multinational corporations [21]. Terminal Applications: Core Demand from Semiconductor Industry - Downstream applications are primarily in semiconductor chip manufacturing, where sputtering target materials are vital for forming key chip structures [22][23]. - The demand for high-quality sputtering targets is driven by the increasing performance requirements of chips in high-performance computing, AI, and 5G communications [22][23]. Market Situation - The global sputtering target market has grown from 82.1 billion yuan in 2018 to 116.3 billion yuan in 2022, with a compound annual growth rate (CAGR) of 9.1% [47]. - The market is projected to reach 194.5 billion yuan by 2027, with a CAGR of 10.7% during the forecast period [47]. Competitive Landscape - The global sputtering target market is characterized by an oligopoly, with major players like JX Nippon Mining, Honeywell, and Tosoh dominating approximately 80% of the market [60][62]. - Domestic companies such as Jiangfeng Electronics and Yuyuan New Materials are making significant strides in technology and market penetration, particularly in the midstream segment [64]. Future Development Trends - The industry is expected to see increased demand for higher purity and quality sputtering targets as semiconductor processes advance to 3nm and below [68]. - Emerging applications in AI, IoT, and automotive sectors are anticipated to drive further growth in the sputtering target market [69]. Core Investment Logic - Investing in semiconductor sputtering targets is fundamentally about investing in certainty, as demand remains closely tied to capital expenditures in wafer manufacturing [74]. - The industry is protected by high technical barriers, long certification cycles, and strong customer loyalty, making it difficult for new entrants [75]. - The narrative of domestic substitution presents a significant investment opportunity, with domestic leaders poised to capture market share from established foreign players [76].