Core Viewpoint - The article provides a comprehensive overview of the evolution of lithography technology from the 1950s to the 21st century, focusing on the advancements in extreme ultraviolet lithography (EUVL) and its significance in semiconductor manufacturing [2][6]. Group 1: Introduction to Lithography Technology - Lithography technology is the cornerstone of modern microelectronics, enabling the precise transfer of complex patterns onto substrates, which directly impacts the integration density, computational performance, and manufacturing costs of integrated circuits [7]. - The application scenarios of lithography technology have expanded from traditional fields such as consumer electronics and medical devices to emerging areas like artificial intelligence and quantum computing, which require high-performance chips [8][9]. Group 2: Overview of Lithography Technology - The basic process of lithography includes substrate preparation, photoresist coating, pre-baking, exposure, development, post-baking, etching, and stripping [10][11]. - Key lithography technologies include deep ultraviolet lithography (DUVL), electron beam lithography (EBL), and nanoimprint lithography (NIL), each with unique characteristics and applications [10][11]. Group 3: Photoresist Materials - Photoresists are sensitive materials used in lithography, classified into positive and negative types based on their behavior after development [12][13]. - The core components of photoresists include film-forming resins and photoinitiators, which play crucial roles in the lithography process [12][13]. Group 4: Development Trends and Challenges - The future of photoresist development focuses on high-resolution materials compatible with EUVL, environmentally friendly options, and multifunctional photoresists that integrate various properties [15][16]. - Key challenges in lithography technology include resolution limits, high costs, and environmental impacts, with ongoing research aimed at addressing these issues through innovative solutions [22][23][24]. Group 5: Summary and Outlook - The evolution of lithography technology has progressed from DUVL to EUVL, achieving mass production capabilities for 5nm and below process nodes, while new types of photoresists are being developed to meet advanced manufacturing needs [16][33]. - Future directions include interdisciplinary collaboration, intelligent lithography systems, and the integration of multifunctional materials to adapt to emerging technologies [16][33].

Core Viewpoint - The Bay Area Semiconductor Expo (Bay Chip Expo) will be held from October 15-17, 2025, in Shenzhen, showcasing the future of the semiconductor industry through high-level discussions, technical forums, and international cooperation [1][3][30]. Group 1: Event Overview - The Bay Area Semiconductor Expo will feature the Bay Area Semiconductor Conference, including two high-end seminars, an opening ceremony, and over 20 technical forums, gathering industry leaders and experts [1][3]. - The event aims to create a high-end platform for technology exchange, industry collaboration, international cooperation, and ecological co-creation [3]. Group 2: High-End Seminars - The event will host a closed-door strategic seminar with top 20 leaders from the semiconductor industry, including executives from ASML and Applied Materials, to discuss future development directions [4][8]. - The Ninth International Advanced Lithography Technology Seminar will focus on cutting-edge advancements in lithography technology and its future [9][11]. Group 3: Technical Forums - Over 20 technical forums will cover various topics, including lithography technology, talent development, investment and financing strategies, and AI applications [16][18]. - The forums will feature discussions on wafer manufacturing, advanced packaging, and IC design, providing insights into the latest technological innovations and industry trends [19][27]. Group 4: Industry Insights - According to the SIA report, global semiconductor sales are expected to exceed $600 billion in 2024, with a projected double-digit percentage growth in 2025, driven primarily by AI applications [13]. - The opening ceremony and semiconductor industry development summit will focus on the impact of AI on chip design and semiconductor manufacturing, inviting experts to share insights on market dynamics [13][15]. Group 5: Additional Activities - The conference will also include forums on investment strategies, overseas expansion, and talent cultivation, along with product launches and award ceremonies to stimulate innovation and industry consensus [28][30]. - The event aims to integrate the innovation chain, talent chain, capital chain, and ecological chain to build a comprehensive semiconductor industry ecosystem [28].

Core Viewpoint - The article discusses the advancements and challenges in lithography technology, particularly in the semiconductor industry, highlighting the need for innovative solutions to meet the growing demand for high-performance, low-energy, and scalable manufacturing processes [2][6][7]. Group 1: Industry Developments - The ability to manufacture nanoscale components is crucial for producing high-performance devices and driving technological advancements across various industries [2]. - Significant investments are being made in semiconductor research, with the U.S. government committing $280 billion through the CHIPS and Science Act, and the EU proposing $50 billion to double its chip production by 2023 [2]. - Taiwan Semiconductor Manufacturing Company plans to invest $33 billion by 2025 to keep pace with Moore's Law by entering new microchip markets [2]. Group 2: Lithography Technology Overview - Lithography is a manufacturing technique that creates patterned structures on substrates, with common methods including photolithography and electron beam lithography [3]. - Traditional lithography methods face challenges related to resolution, position control, and throughput, necessitating the development of new techniques to meet commercial application demands [3][7]. - Emerging lithography technologies are being developed to overcome the limitations of traditional methods, focusing on flexibility, scalability, and cost-effectiveness [6][7]. Group 3: Emerging Lithography Techniques - Various new lithography techniques are summarized, including: - **Nanoimprint Lithography**: High throughput and low cost, but may face issues with pattern replication [8]. - **Two-Photon Lithography**: Capable of generating smaller structures but has high time costs for large structures [8]. - **Block Copolymer Lithography**: Low cost but limited by the periodicity of microdomains [8]. - Each emerging technique has its advantages and disadvantages, with potential applications in various fields, including electronics and biomedicine [8][9]. Group 4: Upcoming Industry Events - The 2025 TrendBank (Fifth) Lithography Materials Industry Conference will be held from July 8-10 in Hefei, focusing on new applications, trends, and in-depth discussions on the lithography materials supply chain [11].