公众号记得加星标⭐️，第一时间看推送不会错过。 在如今的半导体产业中，光刻作为芯片制造的核心工艺，愈发受到重视，在这场围绕纳米级精 度的技术竞逐中，ASML的表现尤为瞩目。 但ASML的能力，远不止于制造众所周知的光刻机。在光刻这门微观艺术里，ASML早已构建 出一整套覆盖前后工序、软硬结合的全景光刻解决方案。这是一个由多项硬件模块、软件平台 与优化算法协同运作的技术系统——涵盖光刻机台、光罩优化、光学对准、计算光刻、缺陷检 测，甚至延伸到晶圆厂工艺协同。 可以说，如今的ASML代表的远不止一台设备，而是光刻背后的一整套技术生态。 为推动光刻技术走近大众视野，激发更多人对芯片制造核心工艺的兴趣，ASML中国在2025年6月20 日隆重举办「ASML杯」光刻「芯」势力知识挑战赛。这不仅是一场面向科技爱好者和专业人才的知 识盛宴，更是一扇通往"全景光刻世界"的探索之门。 目前「ASML杯」光刻「芯」势力知识挑战赛的报名已经正式开始， 欢迎点击文末"阅读原文"或扫 描下方二维码 ，参与这场光刻技术盛宴。 半导体行业观察作为行业知名媒体，自然不会错过这场别开生面的光刻技术挑战赛，在深入了解挑战 赛后，我们发现这些光刻 ...

Core Viewpoint - The Chinese Academy of Sciences has successfully developed a solid-state DUV (Deep Ultraviolet) laser that emits coherent light at 193nm, aligning with the current mainstream DUV exposure wavelength, potentially advancing domestic semiconductor processes to the 3nm node [4]. Group 1: Technology Development - The research team published their findings in the International Society for Optical Engineering, showcasing a solid-state DUV laser source that theoretically supports semiconductor manufacturing processes down to the 3nm node, paving the way for domestic photolithography technology [4]. - The new solid-state laser technology utilizes a Yb:YAG crystal amplifier as the core light source, employing a technique of splitting, frequency conversion, and synthesis to achieve laser output in a fully solid-state structure [5]. Group 2: Comparison with Existing Technologies - Current global photolithography giants like ASML, Nikon, and Canon rely on gas laser technology, specifically fluorine excimer lasers, which require continuous injection of argon-fluorine gas and operate under high-pressure electric fields, making their systems complex and energy-intensive [4][5]. - The solid-state design eliminates the dependency on rare gases, theoretically allowing for a reduction in the size of photolithography systems by over 30% [5]. Group 3: Performance and Future Prospects - The average power output of the new technology is currently 70mW with a frequency of 6kHz, which is only 1% of traditional systems, indicating that there is significant room for improvement [5]. - Achieving breakthroughs in power density and frequency stability could potentially alter the existing technological landscape of DUV photolithography equipment [5]. - The paper acknowledges that there is still a significant gap between the laboratory prototype and industrial applications, necessitating collaborative efforts in materials science and precision manufacturing [5].