证券日报网讯飞凯材料8月19日在互动平台回答投资者提问时表示，公司的i线光刻胶和Barc光刻配套材 料已经在半导体客户端稳定供货，价格会随市场需求、成本等进行动态调整。 （文章来源：证券日报） ...

格隆汇8月19日丨飞凯材料(300398.SZ)在投资者互动平台表示，1、公司的i线光刻胶和Barc光刻配套材 料已经在半导体客户端稳定供货，价格会随市场需求、成本等进行动态调整。2、目前公司产品产能充 足，后续将随客户订单量的变动调配产能与稼动率。3、PCB油墨已处于激烈的市场竞争状态，公司未 来会继续向高附加值产品的开发和应用做导入。4、公司始终致力于为高科技制造提供优质材料，其中 国产替代是重要的实现路径之一，公司四大业务板块的核心产品，均遵循国产替代的逻辑进行开发与导 入，未来，公司将继续坚持自主研发与外延并购相结合的策略，聚焦核心主业，致力于提升整体盈利能 力。 ...

Core Viewpoint - The article highlights the establishment and operational focus of Jiangsu Oumingxin Semiconductor Materials Co., Ltd., which specializes in the research and production of photoresists and supporting materials, emphasizing its role in the domestic semiconductor industry and the shift towards local alternatives [3][4]. Group 1: Company Overview - Jiangsu Oumingxin has officially opened in Suzhou Nano City, focusing on key areas such as third-generation compound semiconductors, LED chips, MEMS, and packaging [3]. - The company has developed a comprehensive product system, including high-resolution i-line photoresists and high-heat electroplating thick film photoresists, which have been successfully applied in mass production by industry leaders like BOE and Zhaochi [3][4]. Group 2: Product Focus - Oumingxin aims for domestic substitution of semiconductor photoresists, utilizing a phenolic resin-azide naphthoquinone system, achieving 100% coverage of LED chip photoresist demand within three months [3][4]. - The company has entered the supply chains of major players such as Zhaochi Semiconductor and Jucan Optoelectronics, leveraging its 20 years of industry experience [4]. Group 3: Technological Innovation - Oumingxin adopts an innovative model of self-designed core raw materials and outsourced processing to overcome the reliance on imported upstream materials, effectively breaking foreign technology monopolies [4]. - The company is committed to technological self-innovation, which is crucial for the stable development of China's semiconductor industry [4]. Group 4: Product Characteristics - High-heat electroplating thick film photoresists can withstand temperatures above 150°C, maintaining performance stability during high-temperature processes [5]. - These photoresists can form thick films up to several hundred micrometers, suitable for specific structures and processes in semiconductor manufacturing [5][6]. - The negative lift-off process photoresists are designed to create specific morphologies that facilitate the lift-off process, ensuring accurate metal deposition on substrates [9][12]. Group 5: Upcoming Events - The 2025 TrendBank (Fifth) Lithography Industry Conference will be held on July 9-10 in Hefei, aiming to gather experts and industry leaders to discuss advancements and challenges in lithography technology and materials [18].

Core Viewpoint - Photoresist is a critical material in semiconductor manufacturing, often referred to as the "brush" for chip production, but it presents significant challenges for domestic companies due to high technical barriers and market monopolies by international giants [2][24]. Group 1: Challenges in Photoresist Production - High technical barriers exist due to complex chemical formulations required for different types of photoresists, such as EUV photoresist, which demands exceptional sensitivity and resolution [4][6]. - Strict purity requirements for photoresist directly impact chip yield and performance, necessitating control at ppb (parts per billion) or even ppt (parts per trillion) levels [7][8]. - Advanced production equipment is essential for photoresist manufacturing, but most of this technology is monopolized by foreign companies, making it difficult for domestic firms to acquire [9]. Group 2: Raw Material Supply Issues - Resin, a core raw material in photoresist, constitutes 10%-40% of the total weight and varies by type, with high-end resins primarily imported due to complex synthesis technologies [11][12]. - Photoinitiators, crucial for initiating photochemical reactions, are predominantly supplied by foreign firms, creating a gap in domestic production capabilities [14]. - Solvents used in photoresist must meet high purity standards, with domestic companies needing to enhance quality control to meet the demands of high-end photoresists [15]. Group 3: Market Landscape - The global photoresist market is dominated by a few international giants, with the top five companies holding over 85% market share, creating significant entry barriers for domestic firms [16][29]. - The domestic photoresist market is growing, with a projected CAGR of about 10% from 2024 to 2029, but high-end products remain largely reliant on imports [28][30]. Group 4: Opportunities for Domestic Companies - National policies are increasingly supportive of the semiconductor industry, including funding and technical guidance for photoresist development [33][34]. - Domestic companies are making strides in the mid-to-low-end photoresist market and are beginning to penetrate the high-end segment, with firms like Nanda Optoelectronics and Beijing Kehua achieving significant milestones [30][31]. Group 5: Investment Considerations - The growing demand for photoresist driven by advancements in semiconductor technology presents investment opportunities, particularly in high-end products [41][42]. - Investors should focus on companies with strong technical capabilities, market competitiveness, and experienced management teams to maximize returns [48][49][50].