2022年，该国还调整了战略，不再仅向制造28纳米及以下芯片的工厂提供优厚激励。对于芯片而言，尺 寸越小性能越高，能效也更好。通过在同一空间容纳更多晶体管，这些芯片可应用于先进人工智能和量 子计算等新技术。但由于这种做法无助于印度发展新兴半导体产业，新德里现在为所有制造工厂(无论 芯片尺寸)以及芯片测试和封装项目承担50%的成本。 来自中国台湾和英国的晶圆厂，以及来自美国和韩国的半导体封装公司都表示有兴趣支持印度的半导体 计划。埃泽尔称："印度政府已拿出慷慨激励措施吸引半导体制造商"，但他强调"这类投资不可能永远 持续"。 漫漫长路 智通财经APP注意到，印度志在成为全球芯片产业的重要参与者，但面临的挑战十分严峻：行业竞争激 烈，且在先进芯片制造竞赛中印度属于后来者。 2022年，当美国限制向中国出口先进人工智能芯片以遏制北京获取尖端技术时，全球半导体自主竞赛拉 开序幕。这对印度而言是一个机遇：该国希望减少对进口的依赖，为战略领域保障芯片供应，并从转移 出中国的全球电子市场中分得更大份额。 印度是全球最大的电子产品消费国之一，但本土芯片产业几乎空白，在全球供应链中扮演的角色微乎其 微。新德里政府的"半导体使命 ...

Core Viewpoint - The competition in the lithography machine market is intensifying, with Canon's nanoimprint lithography (NIL) technology emerging as a cost-effective alternative to ASML's extreme ultraviolet (EUV) lithography, challenging ASML's dominance in the high-end market [1][10]. Group 1: ASML's Dominance - ASML currently holds a 90% market share in the EUV segment, selling machines for $200 million each, with buyers required to sign agreements prohibiting sales to China [4][5]. - Historically, ASML was not a leader in the lithography market, with Japanese companies Canon and Nikon dominating until the early 2000s when ASML pivoted to EUV technology [3][4]. Group 2: Canon's Strategy - Canon has developed NIL technology, which allows for direct imprinting of circuit patterns onto wafers, achieving 14nm line width suitable for 5nm chip production at a significantly lower cost, estimated to be one-tenth of ASML's EUV machines [5][6]. - The NIL technology has a lower energy consumption, reportedly 10% of that of EUV, making it an attractive option for manufacturers looking to reduce costs [6][10]. Group 3: Challenges and Improvements - Canon's NIL technology initially faced challenges with yield rates, which were around 60%, but improvements have raised this to over 90% through better mask materials [7][10]. - Canon is strategically targeting markets such as 3D NAND and CMOS image sensors, where precision requirements are lower, allowing for cost-effective production [7][9]. Group 4: Nikon's Approach - Nikon is not directly competing with ASML in the EUV space but is instead focusing on markets that ASML overlooks, such as the ArF lithography market and advanced packaging technologies [8][9]. - Nikon's return to the ArF market targets 65nm logic chips and CMOS sensors, offering competitive pricing and compatibility with existing facilities [8][9]. Group 5: Global Competition - Other companies globally are also developing alternatives to EUV, with innovations like laser-based X-ray lithography and self-assembling lithography, aiming to reduce costs significantly [10]. - The semiconductor industry is shifting towards a focus on cost-effectiveness rather than solely on advanced technology, indicating a potential shift in market dynamics [10][11]. Group 6: Conclusion - The lithography machine market is evolving, with multiple technologies coexisting, and the emphasis on cost-effectiveness may reshape the competitive landscape, challenging ASML's current supremacy [11].