Group 1 - The global photoresist market is expected to grow at an annual rate of approximately 5% from 2022 to 2027, despite a 2% decline in 2022 due to a drop in demand from the new display industry [4][9] - In the semiconductor sector, the global market size reached $573.5 billion in 2022, with a year-on-year growth of 3.2%, and the consumption of photoresist was approximately 23.8 billion yuan, an increase of 8% [5] - The new display panel market saw a decline in output area by 4.3% in 2022, leading to a 19% decrease in photoresist consumption in this sector [6] Group 2 - China's photoresist demand is projected to grow at an average annual rate of 7% from 2022 to 2027, despite a stagnation in 2022 [9] - In the semiconductor field, China's actual production capacity for 12-inch wafers reached 1.37 million pieces per month in 2022, with a year-on-year growth of 32% [10] - The consumption of photoresist in China's semiconductor industry was 4.6 billion yuan in 2022, reflecting a 15% increase [10] Group 3 - The domestic photoresist production capacity is significantly lower than market demand, with most production focused on PCB photoresist [14] - High-end photoresist products are still largely dependent on imports, with the most advanced domestic semiconductor photoresist being KrF photoresist [15][19] - The key raw materials for photoresist production are primarily imported, leading to a low domestic production rate for these materials [16][31] Group 4 - Several domestic companies have achieved breakthroughs in the production of G/I line photoresists, with KrF photoresist seeing some mature products [19][23] - The TFT positive photoresist market is dominated by foreign companies, with domestic suppliers achieving a 20% market share [26] - The PCB photoresist market is characterized by a tripartite structure among Japan, Taiwan, and mainland China, with domestic companies achieving a 55% localization rate for wet film photoresist [29][30] Group 5 - The Chinese photoresist industry faces significant challenges, including a large technological gap and weak engineering capabilities [37] - The reliance on single-source imports for key raw materials and equipment poses a high supply chain risk for the industry [38]

Core Viewpoint - The article provides an in-depth analysis of photoresists, focusing on their types, compositions, and the processes involved in their application in semiconductor manufacturing. Group 1: Types of Photoresists - Positive photoresists undergo a decomposition reaction upon exposure to light, resulting in high resolution and good contrast, but they have lower adhesion and higher costs [3][8]. - Negative photoresists form a cross-linked structure upon exposure, which enhances adhesion and etch resistance, but can lead to deformation during development [3][37]. Group 2: Composition of Positive Photoresists - The main component of positive photoresists is phenolic resin, which is soluble in alkaline developers and can be easily cross-linked through thermal reactions [12][35]. - The average molecular weight of the resin typically ranges from 1000 to 3000 g/mole, consisting of 8 to 25 repeating units [17]. Group 3: Development Process - The development process for positive photoresists involves using alkaline developers, which are often based on sodium hydroxide or potassium hydroxide solutions [94]. - The choice of developer is crucial, as it must be compatible with the photoresist to ensure effective development without residue [102][106]. Group 4: Process Conditions - Recommended process conditions for applying photoresists include specific spin speeds and baking temperatures to achieve desired film thickness and uniformity [62][73]. - The article emphasizes the importance of controlling environmental factors such as humidity and temperature during the photoresist application process to avoid defects [78][113]. Group 5: Sensitivity to Environmental Factors - Positive photoresists are particularly sensitive to humidity, which can affect their performance during the development process [25][36]. - The article discusses the impact of temperature on the development rate, highlighting the need for precise control to avoid underdevelopment or overdevelopment [113][116]. Group 6: Conclusion - The article concludes that understanding the properties and processes of photoresists is essential for optimizing semiconductor manufacturing and achieving high-quality results [1][10].

Core Viewpoint - The chemical industry is currently at the bottom of its cycle, with prices and spreads still stabilizing, while demand is expected to improve with government policies aimed at economic recovery [1] Group 1: Industry Overview - The chemical industry is experiencing a bottoming phase, with most chemical prices and spreads still in a stabilization process [1] - Domestic capacity is gradually being released, leading to a significant slowdown in supply growth [1] - The report suggests focusing on sectors with relatively certain demand, such as agricultural chemicals and the civil explosives industry benefiting from western development [1] Group 2: Key Recommendations - Emphasis on long-term value of leading companies in the chemical sector, as core assets are expected to see profit and valuation recovery [1] - Recommended leading companies include Wanhua Chemical, Hualu Hengsheng, Huafeng Chemical, Longbai Group, Yangnong Chemical, New Hecheng, Satellite Chemical, Baofeng Energy, Hengli Petrochemical, and Rongsheng Petrochemical [1] Group 3: Subsector Insights - Agricultural chemicals show rigid demand, with steady growth in grain planting area and recovery in compound fertilizer volume and profit [2] - The civil explosives industry is driven by domestic demand, particularly in regions like Xinjiang and Tibet, with increasing concentration benefiting leading companies [2] Group 4: New Material Opportunities - The domestic replacement of chemical new materials is accelerating due to trade tariffs and anti-monopoly pressures [3] - Key areas include adsorption separation materials, lubricating oil components, OLED materials, and high-end photoresists, with specific companies recommended for investment [3] Group 5: Price Recovery Potential - Certain sectors may see profit improvements as supply growth slows and policy constraints are anticipated, particularly in organic silicon and spandex industries [4] - The petrochemical sector may present strategic opportunities following a potential bottoming of oil prices, with recommendations for strategic layouts in refining and downstream polyester filament industries [4]

Core Viewpoint - The global photoresist market is expected to exceed $15 billion by 2025, with China's market share increasing to 35%, highlighting significant growth potential in the industry [2]. Industry Overview - The photoresist industry is a critical component of high-tech materials, encompassing the entire chain from research and development to production and sales [2]. - In the high-end semiconductor photoresist sector, Japanese companies like JSR and Tokyo Ohka dominate with over 85% market share, while domestic production rates are below 5%, indicating a significant technological and market monopoly [2]. Market Dynamics - The advancement in the photoresist industry is driven by downstream demand, where manufacturers' process improvements necessitate technological iterations in photoresists and raw materials [2]. - Domestic manufacturers are increasingly replacing foreign suppliers and expanding production, creating opportunities for photoresist companies [2]. Supply Chain Components - The upstream of the photoresist supply chain includes raw materials such as resins, monomers, photosensitizers, and solvents; the midstream involves the production and synthesis of photoresists based on formulations; and the downstream includes applications in printed circuit boards, LCDs, and IC chips across various industries [2]. Key Raw Materials - Solvents constitute 50%-90% of photoresist composition, essential for dissolving resins and photosensitizers to create a uniform photoresist solution [3][5]. - Photosensitizers, making up 1%-6% of the composition, are crucial for initiating chemical reactions under specific wavelengths of light, altering the solubility of resins during the development process [3][8]. - Resins account for 10%-40% of photoresist, serving as the inert polymer matrix that binds materials together and determines the basic performance of the photoresist after exposure [3]. Market Players - Domestic companies like Yida Co. hold over 40% market share in electronic-grade PM solvents, while other firms like Xilong Science and Jingrui Electric Materials are also making strides in the solvent sector [7]. - The photosensitizer market is dominated by international players such as BASF and IGM Resins, with a trend of production capacity shifting towards China due to patent expirations and increased domestic demand [10]. Product Types and Applications - Different types of photoresists are used for various exposure wavelengths, with global resin supply primarily monopolized by companies like Sumitomo Chemical and Dow Chemical [11]. - Domestic enterprises such as Shengquan Group and Tongcheng New Materials are making significant advancements in photoresist resin production, with some achieving production capacities exceeding 5,000 tons per year [12]. Upcoming Events - The 2025 TrendBank (Fifth) Photoresist Materials Industry Conference will be held from July 8-10 in Hefei, focusing on new applications, current trends, and in-depth discussions on the photoresist supply chain [13].

Core Viewpoint - The company reported a revenue of 1.435 billion yuan for 2024, a year-on-year increase of 10.44%, but faced a significant net loss of 180 million yuan, a decline of 1,311.61% compared to the previous year. The company turned profitable in Q1 2025 with a revenue of 370 million yuan, a year-on-year increase of 12.17% and a net profit of 43.5 million yuan [1][2]. Group 1: Financial Performance - In 2024, the company's gross margin was 19.23%, down 4.39 percentage points year-on-year, and the net margin was -13.34%, down 14.12 percentage points year-on-year [2]. - The company incurred a goodwill impairment of 144 million yuan and other asset impairments totaling 24.93 million yuan, reducing profits by 169 million yuan [2]. - In Q1 2025, the gross margin improved to 23.05%, up 1.65 percentage points year-on-year, and the net margin was 14.29%, an increase of 18.35 percentage points year-on-year [2]. Group 2: Product Performance - The high-purity chemicals segment generated revenue of 778 million yuan in 2024, a year-on-year increase of 11.85%, with a sales volume of 252,400 tons, up 16.83% year-on-year [3]. - High-purity sulfuric acid and high-purity hydrogen peroxide achieved record sales volumes in 2024, with high-purity hydrogen peroxide revenue nearing 350 million yuan, a growth of nearly 15% [3]. - The company is one of the few globally that master the technology for G5 grade high-purity chemicals, supplying over 20 major semiconductor manufacturers domestically [3]. Group 3: Business Development - The company's photoresist segment achieved revenue of 198 million yuan in 2024, a year-on-year increase of 27.61%, with a sales volume of 1,388 tons, up 27.93% year-on-year [4]. - The lithium battery materials segment reported revenue of 260 million yuan, a decline of 5.28% year-on-year, despite a sales volume increase of 15.75% [4]. - The company is expanding its NMP production capacity with a new 60,000-ton production line under construction, which is expected to significantly enhance its output [4]. Group 4: Future Outlook - The company anticipates a gradual improvement in its high-purity chemical layout, maintaining a buy rating despite adjusting profit forecasts for 2025-2027, expecting net profits of 76 million, 112 million, and 155 million yuan respectively [5].

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如果您希望可以时常见面，欢迎标星收藏哦~ 来源：内容编译自semiengineering，谢谢。 在 EUV 光刻技术中，尤其是高数值孔径 EUV，平衡分辨率、灵敏度和线宽粗糙度之间的权衡变 得越来越困难。 使用极端紫外线曝光的光刻图案化依赖于抗蚀剂掩模，该掩模可以同时满足小特征分辨率、对 EUV 波长的高灵敏度以及可接受的线宽粗糙度的目标。不幸的是，光掩模和图案化晶圆之间的最 后一步也是最不可预测和最不为人所知的。 模拟可以准确预测给定的照明和光掩模组合将产生的区域图像。然而，一旦该区域图像遇到光刻 胶，情况就会变得更加复杂。光刻胶是许多不同成分的混合物，它们以不同的方式与 EUV 光子相 互作用。任何给定掩模特征的可打印性取决于其附近的光刻胶成分和 EUV 光子的分布。 化学放大光刻胶 评估光刻工艺的三个关键参数——分辨率、线宽粗糙度和灵敏度——定义了光刻师所谓的 RLS 三 角。在化学放大光刻胶 (CAR) 中，改善其中一个参数通常以牺牲其他两个参数为代价。在这些光 刻胶中，入射光子会产生光酸，进而使光刻胶聚合物脱保护。这使其可溶于显影剂。光刻胶聚合物 的尺寸和光酸扩散距离决定了光刻胶的最终分辨率。 同 ...