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台积电EUV光刻机重大突破!节电44% !
是说芯语· 2025-10-03 01:35
Core Viewpoint - TSMC has significantly reduced the peak power consumption of its advanced EUV lithography equipment by 44%, addressing a major challenge in the semiconductor industry's sustainability efforts [1][3][5]. Group 1: Technological Innovations - The energy efficiency improvement is attributed to deep innovations in equipment collaboration optimization, light source conversion efficiency, and system operation modes [3]. - TSMC's efforts in enhancing manufacturing energy efficiency will effectively reduce the carbon footprint of downstream products, strengthening their market competitiveness [3][5]. Group 2: Industry Context - The semiconductor manufacturing industry is one of the fastest-growing sectors in terms of energy consumption, with TSMC committing to 100% renewable energy usage and net-zero emissions by 2050 [5]. - The energy consumption of manufacturing equipment constitutes a significant portion of the total carbon footprint of chips, making efficiency improvements in core manufacturing equipment crucial for the industry's emission reduction goals [5]. Group 3: Impact of EUV Lithography - A single advanced EUV lithography machine consumes approximately 24,000 to 36,000 kWh per day, equivalent to the daily electricity usage of 1,200 to 1,800 average Chinese households [7][8]. - The reduction of 44% in power consumption translates to an estimated savings of about 13,200 kWh per day for TSMC, leading to annual savings in the range of hundreds of millions of kWh across its production lines [11]. Group 4: Future Outlook - TSMC plans to continue investing in green manufacturing technologies and integrate sustainability deeply into its technological blueprint, aiming to lead the global semiconductor industry towards a more efficient and cleaner future [5].