为现代芯片制造商打造强大、可靠且可制造的光源是当今业界最复杂的挑战之一。在所有光刻系统制 造商中，只有 ASML 成功研发出用于打印最小芯片特征的 EUV 光源——但一家初创公司却提出了 一个颠覆现状的全新理念。 Inversion Semiconductor是一家位于旧金山的初创公司，由风险投资公司 Y Combinator 投资。该 公司计划开发一种基于紧凑型粒子加速器的光源，声称其功率将比 ASML 现有技术高 33 倍，可以 为生产更精细的芯片特征铺平道路。 Inversion技术的核心是一种"台式"粒子加速器，它比传统粒子加速器小 1,000 倍，但输出功率却高 达 10 kW。尽管尺寸微小，但 Inversion 声称，其光源利用激光尾流场加速 (LWFA ) 方法，可以将 芯片制造速度提高 15 倍（假设一个 10 kW 光源为一个光刻系统供电），或者同时为多个芯片制造 工具供电，从而降低成本。 来源：内容编译自 tomshardware 。 图片来源：反转光刻技术 公众号记得加星标⭐️，第一时间看推送不会错过。 Y-Combinator 支持的初创公司着眼于强大的激光尾场加速器，以实现先进的光 ...

Core Viewpoint - The future of artificial intelligence heavily relies on ASML, the only company producing advanced machines (lithography tools) necessary for AI chip manufacturing, amidst geopolitical tensions and competition from China and Japan [1][2]. Group 1: ASML's Technology and Market Position - ASML's latest machine weighs 150 tons, is priced at approximately $350 million, and is currently the most advanced lithography tool available [1]. - ASML's tools are essential for modern chip manufacturing, with a market share exceeding 90% for technologies producing chips at "14nm" and above [2]. - The company has perfected the use of extreme ultraviolet (EUV) light with a wavelength of 13.5nm, enabling the production of chips with features as small as 8nm [4][5]. Group 2: Competitive Landscape - The U.S. has restricted ASML from selling advanced equipment to Chinese manufacturers, prompting China to invest billions in developing domestic alternatives [1][6]. - Canon, ASML's Japanese competitor, is focusing on simpler and cheaper technologies, such as nanoimprint lithography (NIL), which could potentially challenge ASML's dominance [6][7]. - Canon claims its NIL technology could reduce costs by approximately 40% compared to ASML's machines, but it faces challenges in defect rates and throughput [7][8]. Group 3: Future Developments and Challenges - ASML is exploring the development of Hyper NA systems, which could further enhance chip manufacturing capabilities, but these systems will come at a higher cost and complexity [5][6]. - The industry is also looking at wavelengths around 6nm for future advancements, which would require breakthroughs in various technologies [5]. - NIL technology has seen success outside semiconductor manufacturing, particularly in smartphone displays, and may coexist with EUV technology in the future [8].