3D - IC

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国泰海通|全球视野掘金科技牛市·海外市场研究
国泰海通证券研究· 2025-08-12 07:00
Core Viewpoint - The article emphasizes the significance of technology in the Hong Kong stock market for the second half of the year, suggesting that it will be a decisive factor in market performance [6]. Group 1: Market Insights - The Hong Kong stock market is identified as the main battleground for the current bull market, with specific focus on the importance of marginal factors and top picks [6]. - Historical trends indicate that the performance of the Hong Kong stock market is driven by various factors, including the impact of U.S.-China trade tensions and global industrial upgrades [6][7]. Group 2: Sector Analysis - The series of lectures includes discussions on the evolution of technology in the semiconductor industry, particularly the transition from 14nm to N2 processes, which is expected to drive innovation in Electronic Design Automation (EDA) [6][7]. - The analysis of the pricing power in the Hong Kong market highlights the influence of different types of capital and the restructuring of industries following significant mergers, such as Synopsys and Ansys [6][7]. Group 3: Investment Opportunities - The research series explores the growth potential of companies like Tencent Music Entertainment (TME) and NetEase Cloud Music, drawing parallels with Spotify's success [7]. - The focus on AI applications and new consumer trends in the Hong Kong market suggests that companies like Kuaishou and Bilibili are positioned for significant growth, driven by their unique content ecosystems [7].
台积电先进封装奠基人:余振华退休
半导体行业观察· 2025-07-10 01:01
Core Viewpoint - The article discusses the retirement of TSMC's Vice President of R&D, Dr. Yu Zhenhua, highlighting his significant contributions to the semiconductor industry, particularly in advanced packaging technologies and the establishment of TSMC as a leader in the foundry sector [3][5][7]. Group 1: Contributions of Dr. Yu Zhenhua - Dr. Yu Zhenhua joined TSMC in 1994 and played a pivotal role in the development of advanced packaging technologies such as CoWoS and InFO, which have been crucial for TSMC's success in the semiconductor industry [3][5][9]. - He has accumulated over 190 U.S. patents and 173 Taiwanese patents, focusing on low dielectric materials and packaging integration technologies [9]. - Dr. Yu's leadership in the development of 3D chip integration and TSV technology has strengthened the Taiwanese semiconductor supply chain [9]. Group 2: Transition of Leadership - Following Dr. Yu's retirement, his responsibilities will be taken over by Xu Guojin, who has over 30 years of experience in the semiconductor industry and previously held senior positions at Micron [5][11][13]. - Xu Guojin is currently the Vice President of Integrated Interconnect & Packaging at TSMC, focusing on 3D IC and advanced packaging technologies [13]. Group 3: Historical Context and Achievements of TSMC - TSMC's rise to prominence in the semiconductor industry is attributed to key technological breakthroughs, including the 0.13-micron copper process developed in 2003, which significantly enhanced its market position [16][17]. - The article refers to the "Six Knights of TSMC," a group of key figures, including Dr. Yu, who have been instrumental in TSMC's technological advancements and overall success [15][17][22]. - TSMC's focus on advanced packaging has become a major area of growth, with the establishment of the "3D Fabric" brand for its 2.5D and 3D packaging products [25].
晶圆越做越薄背后
半导体行业观察· 2025-03-21 01:08
Core Viewpoint - The demand for ultra-thin wafers is increasing due to the transition from planar SoC to 3D-IC and advanced packaging, which enhances performance and reduces power consumption [1][18]. Group 1: Thin Wafer Processing - The total thickness of HBM modules, which include 12 DRAM chips and basic logic chips, is still less than that of high-quality silicon wafers [1]. - Thin wafers play a crucial role in fan-out wafer-level packaging and advanced 2.5D and 3D packaging for AI applications, which are growing faster than mainstream ICs [1]. - The processing of ultra-thin wafers requires careful decisions regarding temporary bonding adhesives, carrier wafers, and debonding processes [1][3]. Group 2: Challenges in Wafer Thinning - Engineers face challenges in preventing defects or micro-cracks, especially at the wafer edges, which can significantly impact yield [10]. - The thinning process involves a balance of grinding, chemical mechanical polishing (CMP), and etching to meet strict total thickness variation (TTV) specifications [8]. - The most common TSV architecture in silicon features a diameter of 11 micrometers and a depth of 110 micrometers, with a barrier metal and oxide insulation layer occupying 1 micrometer of that diameter [9]. Group 3: Temporary Bonding and Debonding - The industry is refining thinning steps, adhesives, and debonding chemicals, with temporary bonding typically performed under vacuum thermal compression or UV exposure [3][7]. - Glass and silicon carrier wafers are both used, with glass being popular due to its thermal expansion coefficient (CTE) compatibility with silicon [5]. - Mechanical debonding methods are preferred for thinner wafers, as they allow for lower stress levels and better thermal budgets [15]. Group 4: Adhesive Properties and Requirements - Ideal adhesives should bond at low temperatures and withstand high-temperature processing without degrading performance [7]. - The adhesive's uniformity in thickness is critical, as any inconsistency can lead to uneven back grinding and processing challenges [7][8]. - The choice of adhesive is influenced by temperature stability, with some materials capable of withstanding temperatures up to 350°C [7]. Group 5: Yield and Reliability - Chip manufacturers are seeking customized solutions for specific device types, emphasizing the need for tool reliability and process repeatability [2]. - The industry is focused on achieving high yield and reliability in producing ultra-thin devices with thicknesses below 50 micrometers [18]. - The management of back and edge defects is essential for maintaining yield, with selective plasma etching and CVD being employed to mitigate edge defects [10][11].