Core Viewpoint - The 2025 TrendBank (Fifth) Lithography Industry Conference held on July 9 in Hefei focused on advanced lithography technologies and the current state of domestic lithography materials, discussing the need for technological innovation and industrial upgrades to enhance self-sufficiency and quality in the domestic market [1][15]. Group 1: Conference Highlights - The conference covered cutting-edge lithography technologies such as EUV, electron beam lithography, and nanoimprint lithography, along with the analysis of domestic lithography materials like photoresists and wet electronic chemicals [1][2]. - Key discussions included the challenges and solutions in the localization of lithography equipment, focusing on equipment R&D, manufacturing processes, performance improvements, and market conditions [2]. Group 2: Expert Insights - Wang Chengqian emphasized the importance of developing next-generation AI as a strategic resource for gaining a competitive edge in global technology [19]. - Luo Feng highlighted the advantages of physical deposition dry photoresists in HNA-EUV technology, including lower dose requirements and better uniformity [21]. - Zhang Wali discussed the benefits of hybrid bonding technology, which allows for smaller pitch and higher I/O density [23]. - Li Zili introduced directed self-assembly (DSA) techniques for contact hole miniaturization, meeting sub-10nm process node requirements [25]. - Sun Fengxia pointed out the challenges in domestic photoresist localization, including technology monopolies and high entry costs [31]. - 应颖 noted the growth in the display and semiconductor photoresist market, driven by government policies and industry chain development [33]. Group 3: Specialized Forums - The forum on photoresists and wet electronic chemicals featured discussions on trends in packaging technology and the need for environmentally friendly solutions [36]. - SAM SUN explained the challenges in the CAR theory related to photoresist performance and defect management [38]. - Du Mengcheng discussed the technical difficulties in developing PSPI for chip interconnections [40]. - Huang Xinyi emphasized the need to enhance photoresist performance and supply chain resilience to meet ESG goals [48]. - The roundtable featured discussions on various topics related to micro-nano platform processes and industry challenges [50].

Core Insights - The article highlights the innovative development path of Shenzhen Jiyang Intelligent Technology Co., Ltd. in the battery manufacturing sector, emphasizing its role in the transformation of the new energy industry driven by the "dual carbon" goals [1][2] Industry Overview - The new energy industry in China is undergoing a profound transformation from scale expansion to quality improvement, with power batteries being a core component that directly affects industry competitiveness [1] - The Chinese new energy industry is the largest globally, yet it faces significant challenges in battery manufacturing, particularly in logistics, information flow, and energy flow, leading to inefficiencies and safety risks [1] Company Innovations - Jiyang Intelligent has over 800 patents, including 38 international patents, and has established a digital workshop standard system for lithium-ion battery manufacturing [2] - The company has developed advanced equipment such as high-speed laser ear forming machines and intelligent continuous winding machines, breaking foreign monopolies and achieving international advanced technical standards [2] - Jiyang Intelligent has implemented a three-tier safety system ("passive-active-intrinsic") to reduce the probability of thermal runaway in batteries to below 0.01% through AI visual inspection and the application of thermal insulation materials [2] Strategic Directions - The company is focusing on three strategic areas: developing self-learning flexible manufacturing systems, utilizing blockchain technology for carbon emission traceability throughout the battery lifecycle, and creating integrated continuous battery manufacturing equipment for the European market [3] - Jiyang Intelligent has transformed from a technology follower to a rule-maker in the industry within 15 years, actively participating in the formulation of over 70 power battery manufacturing standards [2][3] Future Vision - The ultimate goal of Jiyang Intelligent is to lead in creating a better life through machine innovation, contributing significantly to the global energy transition and high-quality development of China's manufacturing industry [3]

Core Viewpoint - The 2025 TrendBank Lithography Industry Conference aims to address the challenges and advancements in lithography technology, materials, and equipment, focusing on enhancing domestic capabilities in the semiconductor industry [19][20]. Group 1: Conference Overview - The conference will take place on July 9-10, 2025, at the Sheraton Hotel in Hefei, Anhui, with an expected attendance of 300 participants [14]. - The event will feature over 20 guest speakers discussing various topics related to the lithography industry, including advanced lithography technologies and the development of photolithography materials [12][11]. Group 2: Key Topics and Discussions - Discussions will cover the latest research and application prospects of cutting-edge lithography technologies such as EUV, electron beam lithography, and nanoimprint [11]. - The conference will analyze the current state and technological bottlenecks of domestic photolithography materials, including photoresists and wet electronic chemicals, and explore solutions for improving self-sufficiency and quality [11][20]. Group 3: Featured Speakers and Presentations - Dr. Sam Sun, a leading scientist in the field of photoresists and founder of Weifang Xingtai Microelectronics Materials Co., will present on the historical and future perspectives of CAR photoresists [4][2]. - Other notable speakers include industry experts from various institutions discussing topics such as high-performance heterogeneous integration technology and the development of advanced packaging materials [7][8]. Group 4: Industry Challenges - The domestic photolithography industry faces significant challenges, including low self-sufficiency rates in high-end photoresists and reliance on imports for certain high-purity chemical products [19][20]. - The conference aims to foster collaboration among research institutions, universities, and enterprises to accelerate technological innovation and enhance the overall competitiveness of the lithography industry [20].

Core Viewpoint - The 2025 TrendBank Lithography Industry Conference aims to address the challenges and opportunities in the lithography technology sector, particularly in the context of AI advancements and the need for domestic self-sufficiency in semiconductor manufacturing [11][19]. Group 1: Conference Overview - The conference will take place on July 9-10, 2025, at the Sheraton Hotel in Hefei, Anhui, with an expected attendance of 300 participants [11][20]. - The agenda includes discussions on cutting-edge lithography technologies such as EUV, electron beam lithography, and nanoimprint, as well as the current state and technological bottlenecks of lithography materials like photoresists and wet electronic chemicals [11][12]. Group 2: Keynote Speakers and Topics - Wang Chengqian, Director of the Micro System Integration Process Center at Zhongke Xinxin Integrated Circuit Co., will present on "High-Performance Chip Heterogeneous Integration Technology: Opportunities and Challenges" [4][8]. - Other notable speakers include experts from BOE Technology Group and Nankai University, discussing various aspects of lithography technology and materials [8][9]. Group 3: Industry Challenges - The domestic production rate of high-end photoresists is low, and there is a significant gap in R&D and production technology compared to international standards, affecting the quality required for advanced chip manufacturing [18][19]. - The lithography equipment market is dominated by foreign companies, with high-end lithography machines like EUV being particularly difficult to obtain, posing a significant challenge to the domestic semiconductor industry [18][19]. Group 4: Conference Goals - The conference aims to foster collaboration among experts, industry representatives, and academic institutions to enhance the integration of research and application in lithography technology [19]. - It seeks to build a comprehensive ecosystem for the lithography industry, promoting resource integration and competitive advantages [19].