Core Viewpoint - The 2025 TrendBank (Fifth) Lithography Industry Conference held on July 9 in Hefei focused on advanced lithography technologies and the current state of domestic lithography materials, discussing the need for technological innovation and industrial upgrades to enhance self-sufficiency and quality in the domestic market [1][15]. Group 1: Conference Highlights - The conference covered cutting-edge lithography technologies such as EUV, electron beam lithography, and nanoimprint lithography, along with the analysis of domestic lithography materials like photoresists and wet electronic chemicals [1][2]. - Key discussions included the challenges and solutions in the localization of lithography equipment, focusing on equipment R&D, manufacturing processes, performance improvements, and market conditions [2]. Group 2: Expert Insights - Wang Chengqian emphasized the importance of developing next-generation AI as a strategic resource for gaining a competitive edge in global technology [19]. - Luo Feng highlighted the advantages of physical deposition dry photoresists in HNA-EUV technology, including lower dose requirements and better uniformity [21]. - Zhang Wali discussed the benefits of hybrid bonding technology, which allows for smaller pitch and higher I/O density [23]. - Li Zili introduced directed self-assembly (DSA) techniques for contact hole miniaturization, meeting sub-10nm process node requirements [25]. - Sun Fengxia pointed out the challenges in domestic photoresist localization, including technology monopolies and high entry costs [31]. - 应颖 noted the growth in the display and semiconductor photoresist market, driven by government policies and industry chain development [33]. Group 3: Specialized Forums - The forum on photoresists and wet electronic chemicals featured discussions on trends in packaging technology and the need for environmentally friendly solutions [36]. - SAM SUN explained the challenges in the CAR theory related to photoresist performance and defect management [38]. - Du Mengcheng discussed the technical difficulties in developing PSPI for chip interconnections [40]. - Huang Xinyi emphasized the need to enhance photoresist performance and supply chain resilience to meet ESG goals [48]. - The roundtable featured discussions on various topics related to micro-nano platform processes and industry challenges [50].

Core Viewpoint - The 2025 TrendBank (Fifth) Lithography Industry Conference will be held on July 9-10, 2025, in Hefei, focusing on advanced lithography technologies and domestic material production challenges [1][4]. Group 1: Conference Overview - The conference will feature participation from 24 industry, academic, and research institutions, including notable companies and universities [1]. - The event is organized by TrendBank and co-organized by the Shenzhen Semiconductor and Integrated Circuit Industry Alliance, with an expected attendance of 300 people [4]. Group 2: Conference Content - Discussions will cover cutting-edge lithography technologies such as Extreme Ultraviolet Lithography (EUV), electron beam lithography, and nanoimprint lithography, along with their latest research advancements and application prospects [5]. - The conference will analyze the current state and technical bottlenecks of domestic lithography materials, including photoresists, wet electronic chemicals, and masks, aiming to enhance self-sufficiency and quality through technological innovation and industrial upgrades [5]. - Key issues and solutions regarding the localization of lithography equipment, which is essential for semiconductor manufacturing, will also be a focal point, including equipment R&D, manufacturing processes, performance improvements, and market conditions [6].

Core Viewpoint - The 2025 TrendBank Lithography Industry Conference aims to address the challenges and advancements in lithography technology, materials, and equipment within the semiconductor industry, emphasizing the need for domestic innovation and self-sufficiency in light of global supply chain vulnerabilities [26][35][36]. Group 1: Conference Overview - The conference will take place from July 9 to July 10, 2025, in Hefei, Anhui, at the Sheraton Hotel [30][25]. - It will feature over 20 speakers from the lithography industry, covering advanced lithography technologies, photoresists, and wet electronic chemicals [27]. - The event will include academic discussions and a combination of conference and exhibition formats to foster industry collaboration and resource integration [28][29]. Group 2: Industry Challenges - The domestic high-end photoresist supply rate is low, with significant gaps in research and production technology compared to international standards [34]. - There is a reliance on imports for high-purity and specialty wet electronic chemicals, which poses supply risks [34]. - The manufacturing of high-precision masks is challenging, with key raw materials primarily imported, leading to vulnerabilities in rapid repair and update technologies [34]. Group 3: Conference Agenda Highlights - The agenda includes specialized forums on advanced lithography technology, photoresists, and wet electronic chemicals, as well as discussions on the domestic industrialization of semiconductor lithography equipment [16][17][24]. - Key topics will include the development and application trends of advanced packaging materials and the challenges faced in the domestic production of lithography materials [18][19][22]. Group 4: Importance of Lithography Technology - Lithography technology is crucial for semiconductor manufacturing, directly impacting chip performance, integration, and production costs [34]. - The conference aims to enhance the domestic lithography industry's capabilities and competitiveness through expert discussions and collaborative efforts [35].

Core Viewpoint - The 2025 TrendBank Lithography Industry Conference aims to address the challenges and advancements in lithography technology, materials, and equipment, focusing on enhancing domestic capabilities and self-sufficiency in the semiconductor industry [28][39][40]. Group 1: Conference Overview - The conference will be held on July 9-10, 2025, at the Sheraton Hotel in Hefei, Anhui [27]. - It is organized by TrendBank and co-organized by the Shenzhen Semiconductor and Integrated Circuit Industry Alliance [27]. - The event will feature over 20 industry experts discussing various aspects of the lithography supply chain [29]. Group 2: Discussion Topics - Key topics include advanced lithography technologies such as EUV, electron beam lithography, and nanoimprint lithography, along with the current state and technical bottlenecks of lithography materials like photoresists and wet electronic chemicals [28][39]. - The conference will also explore the domestic production challenges of photomasks and lithography equipment, emphasizing the need for innovation and industry upgrades to improve self-sufficiency and quality [28][39]. Group 3: Conference Highlights - The conference will consist of three main sessions focusing on advanced lithography technology, photoresists and wet electronic chemicals, and photomasks and lithography equipment, providing a comprehensive view of the industry [29]. - Academic discussions will be included to establish a theoretical foundation for industry development [30]. - The event will facilitate interaction between upstream and downstream sectors of the industry, promoting resource integration and collaboration [31]. Group 4: Registration and Fees - Registration fees are set at RMB 2600 per person if paid by June 30, 2025, and RMB 2800 thereafter, which includes conference materials and meals [33]. - The conference aims to build a communication bridge for enterprises across the lithography supply chain [39]. Group 5: Industry Context - The lithography technology is crucial for semiconductor manufacturing, directly impacting chip performance, integration, and production costs [38]. - The domestic lithography industry faces challenges such as low self-sufficiency in high-end photoresists and reliance on imports for critical materials and equipment [38][39].

Core Viewpoint - The 2025 TrendBank (Fifth) Lithography Industry Conference will be held on July 9-10, 2025, in Hefei, focusing on advanced lithography technologies, materials, and equipment, addressing challenges and opportunities in the domestic semiconductor industry [29][30][41]. Group 1: Conference Overview - The conference will feature over 20 industry chain guests delivering speeches, covering advanced lithography technologies, photoresists, wet electronic chemicals, masks, and lithography equipment [31][30]. - The event aims to promote deep integration of industry, academia, and research, enhancing communication and cooperation among research institutions, universities, and enterprises [41][30]. - The conference will provide a platform for resource integration and complementary advantages, aiming to build a complete industrial ecosystem and enhance the overall competitiveness of the lithography industry [41][30]. Group 2: Key Topics and Challenges - Discussions will include the latest research progress and application prospects of cutting-edge lithography technologies such as EUV, electron beam lithography, and nanoimprint [30][41]. - The conference will analyze the current status and technical bottlenecks of domestic photoresists, wet electronic chemicals, and masks, emphasizing the need for technological innovation and industrial upgrades to improve self-sufficiency and quality levels [40][30]. - The challenges faced by the domestic lithography industry include low self-sufficiency rates in high-end photoresists, reliance on imports for certain high-purity products, and the need for advancements in mask manufacturing technology [40][41]. Group 3: Event Logistics - The conference will take place at the Hefei New Station Li Gang Sheraton Hotel, with an expected attendance of around 300 participants [29][30]. - Registration fees are set at RMB 2600 before June 30 and RMB 2800 thereafter, which includes conference materials, meals, and access to guest presentations [35][30].

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Core Viewpoint - The 2025 TrendBank Lithography Industry Conference aims to address the challenges and advancements in lithography technology, materials, and equipment, focusing on enhancing domestic capabilities in the semiconductor industry [22][23]. Conference Overview - The conference will take place on July 9-10, 2025, at the Sheraton Hotel in Hefei, Anhui, with an expected attendance of 300 participants [18][22]. - The event will feature over 20 speakers from the lithography industry, covering advanced lithography technologies, photoresists, wet electronic chemicals, and mask manufacturing [15][18]. Key Topics of Discussion - The conference will explore cutting-edge lithography technologies such as extreme ultraviolet (EUV), electron beam lithography, and nanoimprint lithography, along with the current state and technological bottlenecks of domestic photoresists and wet electronic chemicals [14][22]. - Discussions will also focus on the challenges faced in the localization of lithography equipment, including the development, manufacturing processes, and market conditions [14][22]. Industry Challenges - The domestic high-end photoresist supply rate is low, and there is a significant gap in research and production technology compared to international standards, affecting the quality and performance required for advanced chip manufacturing [22][23]. - The supply of high-purity and specialty wet electronic chemicals is heavily reliant on imports, posing risks to the supply chain [22][23]. Conference Highlights - The event will include academic discussions aimed at establishing a theoretical foundation for industry development, fostering deep integration of production, learning, and research [16][18]. - A roundtable forum will be held to facilitate interaction and resource integration among upstream and downstream enterprises in the lithography supply chain [17][18]. Keynote Speakers - Notable speakers include Ma Hao, a senior liquid chromatography engineer from Agilent Technologies, who will present on new trends in IC photoresist characterization [10][11].

Core Viewpoint - The 2025 TrendBank Lithography Industry Conference aims to address the challenges and advancements in lithography technology, materials, and equipment, focusing on enhancing domestic capabilities in the semiconductor industry [21][22]. Group 1: Conference Overview - The conference will take place on July 9-10, 2025, at the Sheraton Hotel in Hefei, Anhui, with an expected attendance of 300 participants [16][21]. - The event will feature over 20 guest speakers discussing various topics related to the lithography industry, including advanced lithography technologies and the development of photolithography materials [14][22]. Group 2: Industry Challenges - The domestic high-end photolithography materials have a low self-sufficiency rate, with significant gaps in research and production technology compared to international standards [21]. - The supply of high-purity and specialized wet electronic chemicals is heavily reliant on imports, posing risks to the supply chain [21]. - The manufacturing technology for high-precision photomasks is complex, with key raw materials also primarily imported, which limits domestic production capabilities [21]. Group 3: Key Topics of Discussion - The conference will cover cutting-edge lithography technologies such as extreme ultraviolet lithography (EUV), electron beam lithography, and nanoimprint lithography, along with their latest research progress and application prospects [13]. - Discussions will also focus on the current state and technological bottlenecks of photolithography materials, including photopolymers and wet electronic chemicals, and strategies for improving domestic production and quality [13][22]. - The event aims to foster collaboration between academia, research institutions, and industry players to accelerate technological innovation and enhance the overall competitiveness of the lithography industry [22].

Core Viewpoint - The 2025 TrendBank Lithography Industry Conference aims to address the challenges and advancements in lithography technology, materials, and equipment, focusing on enhancing domestic capabilities in the semiconductor industry [19][20]. Group 1: Conference Overview - The conference will take place on July 9-10, 2025, at the Sheraton Hotel in Hefei, Anhui, with an expected attendance of 300 participants [14]. - The event will feature over 20 guest speakers discussing various topics related to the lithography industry, including advanced lithography technologies and the development of photolithography materials [12][11]. Group 2: Key Topics and Discussions - Discussions will cover the latest research and application prospects of cutting-edge lithography technologies such as EUV, electron beam lithography, and nanoimprint [11]. - The conference will analyze the current state and technological bottlenecks of domestic photolithography materials, including photoresists and wet electronic chemicals, and explore solutions for improving self-sufficiency and quality [11][20]. Group 3: Featured Speakers and Presentations - Dr. Sam Sun, a leading scientist in the field of photoresists and founder of Weifang Xingtai Microelectronics Materials Co., will present on the historical and future perspectives of CAR photoresists [4][2]. - Other notable speakers include industry experts from various institutions discussing topics such as high-performance heterogeneous integration technology and the development of advanced packaging materials [7][8]. Group 4: Industry Challenges - The domestic photolithography industry faces significant challenges, including low self-sufficiency rates in high-end photoresists and reliance on imports for certain high-purity chemical products [19][20]. - The conference aims to foster collaboration among research institutions, universities, and enterprises to accelerate technological innovation and enhance the overall competitiveness of the lithography industry [20].

Core Viewpoint - The 2025 TrendBank Lithography Industry Conference aims to address the challenges and opportunities in the lithography technology sector, particularly in the context of AI advancements and the need for domestic self-sufficiency in semiconductor manufacturing [11][19]. Group 1: Conference Overview - The conference will take place on July 9-10, 2025, at the Sheraton Hotel in Hefei, Anhui, with an expected attendance of 300 participants [11][20]. - The agenda includes discussions on cutting-edge lithography technologies such as EUV, electron beam lithography, and nanoimprint, as well as the current state and technological bottlenecks of lithography materials like photoresists and wet electronic chemicals [11][12]. Group 2: Keynote Speakers and Topics - Wang Chengqian, Director of the Micro System Integration Process Center at Zhongke Xinxin Integrated Circuit Co., will present on "High-Performance Chip Heterogeneous Integration Technology: Opportunities and Challenges" [4][8]. - Other notable speakers include experts from BOE Technology Group and Nankai University, discussing various aspects of lithography technology and materials [8][9]. Group 3: Industry Challenges - The domestic production rate of high-end photoresists is low, and there is a significant gap in R&D and production technology compared to international standards, affecting the quality required for advanced chip manufacturing [18][19]. - The lithography equipment market is dominated by foreign companies, with high-end lithography machines like EUV being particularly difficult to obtain, posing a significant challenge to the domestic semiconductor industry [18][19]. Group 4: Conference Goals - The conference aims to foster collaboration among experts, industry representatives, and academic institutions to enhance the integration of research and application in lithography technology [19]. - It seeks to build a comprehensive ecosystem for the lithography industry, promoting resource integration and competitive advantages [19].