Core Viewpoint - The 9th International Advanced Lithography Technology Symposium (IWAPS) will be held on October 14-15, 2025, in Shenzhen, aiming to create a global platform for communication and collaboration in the lithography technology field [4]. Group 1: Event Overview - The symposium is organized by the China Integrated Circuit Innovation Alliance and the Chinese Optical Society, with support from various institutions, including the Chinese Academy of Sciences and the Shenzhen Semiconductor and Integrated Circuit Industry Alliance [4]. - IWAPS aims to build a dialogue platform covering the entire lithography industry chain, including equipment, process technology, metrology, mask materials, computational lithography, and new technologies [4]. Group 2: Participation and Submission - Papers submitted to the symposium will be reviewed for inclusion in the SPIE Digital Library and EI [8][12]. - The abstract submission deadline is July 31, 2025, and the full paper submission deadline is September 30, 2025 [11][12]. - Authors are encouraged to submit abstracts that clearly describe the nature, research topics, and significance of their work, with a maximum of 500 words [11]. Group 3: Historical Context - IWAPS has been held annually since its inception, with previous events taking place in various cities, including Beijing, Xiamen, Nanjing, Chengdu, and Lishui [13][20][21][29]. - The symposium has successfully facilitated discussions and advancements in lithography technology over the years, contributing to the growth of the industry [36].

Core Viewpoint - The article discusses the current state and future prospects of the semiconductor mask market in China, highlighting the dominance of international players and the low domestic production rates of high-end masks [1]. Group 1: Market Overview - The global semiconductor mask market is primarily consumed by wafer fabs or IDM manufacturers, with low-end products outsourced to independent third-party manufacturers [1]. - Major international companies such as Photronics (USA), Toppan (Japan), and DNP (Japan) dominate the Chinese semiconductor mask market [1]. - The domestic production rate of semiconductor masks in China is approximately 10%, with 90% of masks imported, and the localization rate for high-end masks is only 3% [1]. Group 2: Company Performance - Longtu Optoelectronics achieved a revenue growth of 17.59% in 2024 for flat panel display masks, driven by increased new product development and production scale [4]. - The revenue from semiconductor chip masks for Longtu Optoelectronics grew by 33.98% in 2024, attributed to enhanced technical capabilities and optimized product structure [4]. - The company has reached international standards for semiconductor masks above the 130nm process node, with successful mass production of 130nm masks and ongoing development for higher nodes [5]. Group 3: Product Capabilities - Longtu Optoelectronics has developed high-precision TFT masks and is advancing in high-specification semi-transparent masks and PSM technology [6]. - Lu Wei Optoelectronics reported a revenue increase of 30.21% in 2024, with significant growth in OLED masks and advanced packaging masks becoming a second growth curve [6]. - The company has achieved mass production of 180nm process node semiconductor masks and is working on 150nm and 130nm mask technologies [8]. Group 4: Industry Events - The 2025 TrendBank (5th) Lithography Industry Conference will be held on July 9-10 in Hefei, aiming to gather experts and industry leaders to discuss advancements and challenges in lithography technology [10].

Core Viewpoint - The 2025 TrendBank Lithography Industry Conference aims to address the challenges and advancements in lithography technology, materials, and equipment, fostering collaboration among experts and industry leaders to enhance the domestic semiconductor industry's capabilities [24][23]. Conference Details - The conference will take place on July 9-10, 2025, at the Sheraton Hotel in Hefei, Anhui, with an expected attendance of 300 participants [13][6]. - The agenda includes discussions on advanced lithography technologies, photolithography materials, and equipment, covering the entire industry chain [15][14]. Key Topics of Discussion - The conference will explore cutting-edge lithography technologies such as EUV, electron beam lithography, and nanoimprint lithography, along with the current state and technological bottlenecks of domestic photolithography materials [14][22]. - Specific sessions will focus on the development and challenges of photolithography resins, wet electronic chemicals, and mask manufacturing technologies [11][12]. Expert Participation - Notable speakers include Li Zili, a researcher from Fudan University, who will present on guided self-assembly lithography technology for integrated circuit manufacturing [10][7]. - The conference will feature over 20 industry experts sharing insights through keynote speeches and specialized discussions [15]. Industry Challenges - The domestic lithography industry faces significant challenges, including low self-sufficiency rates in high-end photolithography resins and reliance on imports for critical materials and equipment [22][23]. - The conference aims to address these challenges and promote technological innovation and industrial upgrades to enhance the competitiveness of the lithography sector [23][24].

Core Viewpoint - The 2025 TrendBank Lithography Industry Conference aims to address the challenges and advancements in lithography technology, materials, and equipment, focusing on enhancing domestic capabilities and self-sufficiency in the semiconductor industry [20][22][23]. Conference Overview - The conference will take place on July 9-10, 2025, at the Sheraton Hotel in Hefei, Anhui, with an expected attendance of 300 participants [11][12]. - It will feature over 20 speakers from the lithography industry, covering various topics related to advanced lithography technologies and materials [10][12]. Key Topics - Discussions will include the latest research and application prospects of cutting-edge lithography technologies such as EUV, electron beam lithography, and nanoimprint lithography [9][20]. - The conference will also analyze the current state and technological bottlenecks of lithography materials, including photoresists and wet electronic chemicals, and explore solutions for improving domestic production and quality [9][20][22]. Industry Challenges - The domestic lithography industry faces significant challenges, including low self-sufficiency rates for high-end photoresists and reliance on imports for certain high-purity electronic chemicals and mask materials [20][22]. - The high-precision manufacturing technology for masks is difficult, and the rapid repair and update technologies need improvement [20]. Strategic Importance - The conference aims to foster collaboration among experts, scholars, and industry representatives to enhance the integration of production, learning, and research, thereby accelerating technological innovation and the transformation of results [22]. - It seeks to build a communication bridge for upstream and downstream enterprises in the industry chain, promoting resource integration and competitive advantages [22].

Core Viewpoint - The 2025 TrendBank Lithography Industry Conference aims to address the challenges and advancements in lithography technology, materials, and equipment, focusing on enhancing domestic capabilities and self-sufficiency in the semiconductor industry [12][21]. Conference Overview - The conference will take place on July 9-10, 2025, in Hefei, Anhui, at the Sheraton Hotel [16][20]. - It will feature over 20 industry experts discussing advanced lithography technologies, including EUV, electron beam lithography, and nanoimprint techniques [13][12]. - The agenda includes sessions on lithography materials, chemical products, and equipment, emphasizing the need for domestic production and innovation [12][21]. Keynote Speakers and Topics - Li Jiarong, General Manager of Hangzhou Zhongtai Hydrogen Energy Technology Co., will present on "Application of Lithography Gases and Development of China's Rare Gas Industry" [6][11]. - Other notable speakers include representatives from BOE Technology Group and Nankai University, discussing various aspects of lithography technology and materials [9][10]. Industry Challenges - The domestic lithography industry faces significant challenges, including low self-sufficiency in high-end photoresists and reliance on imports for critical materials and equipment [20][21]. - The conference aims to foster collaboration between academia and industry to address these challenges and promote technological innovation [21][12]. Registration and Participation - Registration fees are set at RMB 2600 before June 30 and RMB 2800 thereafter, which includes conference materials, meals, and a gala dinner [17][16]. - The conference is expected to attract around 300 participants, providing a platform for networking and resource integration within the lithography supply chain [16][21].

Core Viewpoint - The 2025 TrendBank Lithography Industry Conference aims to address the challenges and advancements in lithography technology, materials, and equipment, focusing on enhancing domestic capabilities in the semiconductor industry [19][20]. Group 1: Conference Overview - The conference will take place on July 9-10, 2025, at the Sheraton Hotel in Hefei, Anhui, with an expected attendance of 300 participants [14][19]. - The event will feature over 20 speakers from the lithography industry, covering advanced lithography technologies, photoresists, and equipment [12][20]. - The agenda includes discussions on cutting-edge lithography techniques such as EUV, electron beam lithography, and nanoimprint lithography, as well as the current state and challenges of domestic photoresist production [11][19]. Group 2: Key Topics and Challenges - The conference will explore the low self-sufficiency rate of high-end photoresists in China and the technological gaps compared to international standards [19][20]. - It will address the reliance on imports for high-purity electronic chemicals and the challenges in the precision manufacturing of photomasks [19][20]. - The event aims to foster collaboration between academia, research institutions, and industry to enhance innovation and the domestic supply chain in lithography technology [20]. Group 3: Featured Speakers and Sessions - Notable speakers include Zhang Wali, who will present on the application and challenges of hybrid bonding in advanced packaging [7][11]. - Other sessions will cover topics such as the development of new photoresist materials and the application mechanisms of wet electronic chemicals [8][11]. - The conference will also feature a roundtable discussion on the current state and future trends of the mask and lithography equipment industry [9][11]. Group 4: Industry Context - The lithography technology is critical for semiconductor manufacturing, directly impacting chip performance, integration, and production costs [19]. - The conference aims to strengthen the self-sufficiency of the lithography industry in China amid increasing geopolitical tensions affecting the semiconductor supply chain [20]. - The event will serve as a platform for resource integration and collaboration among upstream and downstream enterprises in the lithography supply chain [20].

Core Viewpoint - The 2025 TrendBank Lithography Industry Conference aims to address the challenges and advancements in lithography technology, materials, and equipment, focusing on enhancing domestic capabilities and self-sufficiency in the semiconductor industry [21][22]. Group 1: Conference Overview - The conference will take place on July 9-10, 2025, at the Sheraton Hotel in Hefei, Anhui, with an expected attendance of 300 participants [15][21]. - The agenda includes discussions on advanced lithography technologies, the current state of lithography materials, and the challenges faced in domestic production [13][22]. - Keynote speakers and industry experts will present on various topics, including the latest research in extreme ultraviolet lithography (EUV) and the domestic production of photoresists and wet electronic chemicals [10][14]. Group 2: Industry Challenges - The domestic high-end photoresist supply rate is low, and the technology lags behind international standards, affecting the performance and quality required for advanced chip manufacturing [21][22]. - The reliance on imports for high-purity and specialized wet electronic chemicals poses a supply risk, while the manufacturing of high-precision masks remains a significant challenge [21][22]. - The lithography equipment market is dominated by foreign companies, with domestic manufacturers facing substantial technological and precision gaps [21][22]. Group 3: Company Profile - Jiangsu Jicui Photo-sensitive Electronic Materials Research Institute, established in June 2021, focuses on the R&D and industrialization of photoresist raw materials and related technologies [7][8]. - The company has achieved recognition as a high-tech enterprise and is a member of the "Integrated Circuit Photoresist Industry Innovation Alliance" [8]. - The company has successfully developed several KrF photoresist resins that have passed customer testing and are in small-scale production [8]. Group 4: Conference Highlights - The conference will feature over 20 speakers from the lithography industry, providing insights and fostering interaction across the supply chain [14]. - Three main sessions will cover advanced lithography technologies, photoresists and wet electronic chemicals, and mask and lithography equipment, offering a comprehensive view of the industry [14]. - The event aims to facilitate collaboration between academia, research institutions, and industry players to enhance innovation and technology transfer [22].

"宁波膜智信息科技有限公司"为势银（TrendBank）唯一工商注册实体及收款账户 势银研究： 势银产业研究服务 势银数据： 势银数据产品服务 势银咨询： 势银咨询顾问服务 重要会议： 7月9日-10日，2025势银（第五届）光刻产业大会（安徽合肥） 点此报名 添加文末微信，加 光刻胶 群 在半导体芯片集成高密化和线路精细化上，光刻与刻蚀承担着重要的工艺角色，尤其是在半导体前 道制程中，光刻机与刻蚀机分辨率很大程度上决定了集成电路精细化发展水平。在这里我们重点阐 述光刻产业话题。 | 制程 | 晶圆尺寸 | 金属材料 | 光刻机类型 | | --- | --- | --- | --- | | 0.5µm | 200mm | Al | g-line:436nm | | 0.35µm | 200mm | Al | i-line:365nm | | 0.25µm | 200mm | Al | KrF:248nm(stepper) | | 0.18/0.15µm | 200mm | Al | KrF:248(stepper&scanner) | | 0.13µm | 200/300mm | Al/Cu | ArF: ...

Core Viewpoint - The article discusses the advancements and challenges in lithography technology, particularly in the semiconductor industry, highlighting the need for innovative solutions to meet the growing demand for high-performance, low-energy, and scalable manufacturing processes [2][6][7]. Group 1: Industry Developments - The ability to manufacture nanoscale components is crucial for producing high-performance devices and driving technological advancements across various industries [2]. - Significant investments are being made in semiconductor research, with the U.S. government committing $280 billion through the CHIPS and Science Act, and the EU proposing $50 billion to double its chip production by 2023 [2]. - Taiwan Semiconductor Manufacturing Company plans to invest $33 billion by 2025 to keep pace with Moore's Law by entering new microchip markets [2]. Group 2: Lithography Technology Overview - Lithography is a manufacturing technique that creates patterned structures on substrates, with common methods including photolithography and electron beam lithography [3]. - Traditional lithography methods face challenges related to resolution, position control, and throughput, necessitating the development of new techniques to meet commercial application demands [3][7]. - Emerging lithography technologies are being developed to overcome the limitations of traditional methods, focusing on flexibility, scalability, and cost-effectiveness [6][7]. Group 3: Emerging Lithography Techniques - Various new lithography techniques are summarized, including: - **Nanoimprint Lithography**: High throughput and low cost, but may face issues with pattern replication [8]. - **Two-Photon Lithography**: Capable of generating smaller structures but has high time costs for large structures [8]. - **Block Copolymer Lithography**: Low cost but limited by the periodicity of microdomains [8]. - Each emerging technique has its advantages and disadvantages, with potential applications in various fields, including electronics and biomedicine [8][9]. Group 4: Upcoming Industry Events - The 2025 TrendBank (Fifth) Lithography Materials Industry Conference will be held from July 8-10 in Hefei, focusing on new applications, trends, and in-depth discussions on the lithography materials supply chain [11].

Core Viewpoint - The article discusses the advancements and challenges in the semiconductor lithography industry, particularly focusing on EUV lithography and emerging technologies like Inversion Semiconductor's particle accelerator-based light source and Atum Works' 3D printing technology for chip manufacturing [1][2][14]. Group 1: EUV Lithography and Inversion Semiconductor - ASML's EUV lithography machines are essential for modern chip production, especially as processes advance to 3nm technology [1]. - The importance of EUV lithography is increasing, with ASML leading the transition to High NA EUV to meet stricter customer demands [1]. - Inversion Semiconductor aims to utilize a "desktop" particle accelerator to produce high-power light, significantly reducing the size of traditional accelerators from kilometers to about one meter [3][4]. - The company plans to achieve a light source output power of 10 kilowatts, which could generate billions in annual revenue for wafer fabs [2][6]. Group 2: Laser Wakefield Acceleration (LWFA) - Inversion Semiconductor's technology leverages Laser Wakefield Acceleration (LWFA) to accelerate electrons to high energies over short distances, enhancing the efficiency of light generation [3][4]. - The collaboration with Lawrence Berkeley National Laboratory aims to develop a high-power, tunable light source named STARLIGHT, targeting soft X-rays in the range of 20nm to 6nm [6][7]. - The anticipated improvements include doubling transistor density and tripling throughput compared to existing machines, potentially allowing a single light source to power multiple lithography machines [7][8]. Group 3: Alternative Lithography Technologies - Lace Lithography AS is exploring atom-based lithography, claiming it can achieve resolutions beyond the limits of current EUV technology, offering a cost-effective and energy-efficient alternative [8][9]. - The company is developing a prototype that utilizes metastable atoms and dispersion force-based masks to achieve 2nm feature sizes, currently in the concept validation stage [9][10]. - Atum Works is promoting its nano-scale 3D printing technology, which could reduce chip manufacturing costs by up to 90%, although it currently lags behind mainstream logic chip technology by about 20 years [14][15]. Group 4: Future Prospects and Industry Impact - The semiconductor industry is facing fundamental bottlenecks in 2D lithography, prompting a shift towards 3D integration to accommodate more transistors and bandwidth on chips [14][15]. - Atum Works' 3D printing technology aims to simplify the manufacturing process by enabling direct material deposition in three-dimensional space, potentially improving yield and efficiency [15][16]. - The advancements in lithography technologies, including both EUV and emerging alternatives, indicate a dynamic landscape in semiconductor manufacturing, with significant implications for future chip design and production [16].