证券研究报告 | 行业深度 gszqdatemark 2026 01 23 年 月 日 制造 EDA 是集成电路生产过程中的核心环节。一个完整的集成电路设计 和制造流程主要包括工艺平台开发、集成电路设计和集成电路制造三个阶 段。集成电路企业需要使用 EDA 工具完成设计和制造的过程。制造 EDA 是集成电路生产过程中的核心环节。在晶圆厂 包括晶圆代工厂、 IDM 制 造部门等）工艺平台开发阶段，通过制造 EDA 建立半导体器件的模型并通 过 PDK 或建立 IP 和标准单元库等方式提供给集成电路设计企业 包括芯 片设计公司、半导体 IP 公司、IDM 设计部门等）；在晶圆生产阶段，从版 图到掩模的数据转换过程中，需要制造 EDA 对光刻过程中的光学邻近效 应进行补偿和修正、建立详细的结构器件模型、良率修正等。根据制造 EDA 所解决的技术类别不同，制造 EDA 可分为六大部分：工艺平台开发阶段， 可分为工艺与器件仿真工具 TCAD）、器件建模及验证工具、工艺设计套 件工具 PDK）；晶圆生产制造阶段，可分为计算光刻软件、可制造性设 计 DFM）、良率控制工具，其中计算光刻软件是晶圆生产阶段的核心工 具。根据我 ...

Core Insights - The article discusses the critical role of lithography technology in semiconductor manufacturing, particularly the challenges posed by the shrinking feature sizes of chips and the need for advanced correction techniques like Inverse Lithography Technology (ILT) [1][3]. Group 1: Lithography Technology - Lithography is essential for transferring integrated circuit patterns, facing challenges due to optical proximity effects as feature sizes decrease [1]. - Optical Proximity Correction (OPC) has evolved from rule-based to model-driven approaches, but traditional methods struggle with complex chip designs [1][3]. - ILT offers a new solution by mathematically reversing the lithography process, allowing for more precise compensation of optical distortions and etching effects [4][10]. Group 2: D2S, Inc and GPU Acceleration - D2S, Inc is a leader in GPU-accelerated solutions for semiconductor manufacturing, focusing on model-based processing technologies for nanoscale device fabrication [2]. - The introduction of GPU technology has transformed ILT from a theoretical concept to practical application, enabling full-chip processing that was previously limited by CPU capabilities [5][7]. - D2S's innovations, such as pixel-level dose correction (PLDC), enhance the accuracy and efficiency of mask writing processes [4][7]. Group 3: Market Trends and Future Outlook - The global market for computational lithography software is projected to grow from $1.268 billion in 2024 to $2.368 billion by 2031, driven by AI-enhanced solutions [9]. - AI is expected to complement existing technologies by optimizing model construction and accelerating ILT processes, thereby enhancing the overall efficiency of lithography [9][10]. - Full-chip ILT is seen as a foundational technology for future semiconductor generations, potentially enabling significant advancements in chip design and manufacturing processes [10][11].