Core Viewpoint - The National Integrated Circuit Industry Investment Fund Phase III is being adjusted to enhance China's semiconductor capabilities in response to U.S. technology restrictions, focusing on domestic innovation and reducing reliance on foreign technologies [1][2]. Group 1: Fund Overview - The National Integrated Circuit Industry Investment Fund Phase III was established in 2024 with a registered capital of 344 billion yuan, following the first phase at 138.7 billion yuan and the second phase at 204.15 billion yuan [1]. - The fund aims to support semiconductor equipment and materials, particularly high-value DRAM chips, AI chips, advanced semiconductor equipment, and materials like photoresists [1][2]. Group 2: Market Context - The ongoing U.S.-China tech friction has led to tighter export controls on high-end chips and related technologies, prompting a shift in funding priorities towards domestic development of lithography machines and EDA tools [2]. - Analysts suggest that the adjustments in the fund could accelerate breakthroughs in critical areas of the semiconductor supply chain, although fully replacing foreign technology in the short term remains challenging [2]. Group 3: Upcoming Conference - The 2025 TrendBank Lithography Industry Conference will be held on July 9-10, 2025, in Hefei, Anhui, gathering experts and industry leaders to discuss advancements and challenges in lithography technology and materials [5]. - The conference will feature various sessions on advanced lithography technologies, materials, and applications, including discussions on the development of photoresist materials and their market analysis [7][8].

Core Viewpoint - The 2025 TrendBank Lithography Industry Conference aims to address the challenges and advancements in lithography technology, materials, and equipment, focusing on enhancing domestic capabilities in the semiconductor industry [22][23]. Conference Overview - The conference will take place on July 9-10, 2025, at the Sheraton Hotel in Hefei, Anhui, with an expected attendance of 300 participants [18][22]. - The event will feature over 20 speakers from the lithography industry, covering advanced lithography technologies, photoresists, wet electronic chemicals, and mask manufacturing [15][18]. Key Topics of Discussion - The conference will explore cutting-edge lithography technologies such as extreme ultraviolet (EUV), electron beam lithography, and nanoimprint lithography, along with the current state and technological bottlenecks of domestic photoresists and wet electronic chemicals [14][22]. - Discussions will also focus on the challenges faced in the localization of lithography equipment, including the development, manufacturing processes, and market conditions [14][22]. Industry Challenges - The domestic high-end photoresist supply rate is low, and there is a significant gap in research and production technology compared to international standards, affecting the quality and performance required for advanced chip manufacturing [22][23]. - The supply of high-purity and specialty wet electronic chemicals is heavily reliant on imports, posing risks to the supply chain [22][23]. Conference Highlights - The event will include academic discussions aimed at establishing a theoretical foundation for industry development, fostering deep integration of production, learning, and research [16][18]. - A roundtable forum will be held to facilitate interaction and resource integration among upstream and downstream enterprises in the lithography supply chain [17][18]. Keynote Speakers - Notable speakers include Ma Hao, a senior liquid chromatography engineer from Agilent Technologies, who will present on new trends in IC photoresist characterization [10][11].

Core Viewpoint - The 2025 TrendBank Lithography Industry Conference aims to address the challenges and advancements in lithography technology, materials, and equipment, focusing on enhancing domestic capabilities and self-sufficiency in the semiconductor industry [23][25][26]. Group 1: Conference Overview - The conference will take place on July 9-10, 2025, at the Sheraton Hotel in Hefei, Anhui, with an expected attendance of 300 participants [14][25]. - The event will feature over 20 speakers from the lithography industry, covering various topics related to advanced lithography technologies and materials [13][15]. - The agenda includes specialized sessions on advanced lithography technology, photoresists, and wet electronic chemicals, as well as discussions on the current state and future trends of the industry [12][15]. Group 2: Industry Challenges - The domestic high-end photoresist supply rate is low, and there is a significant gap in R&D and production technology compared to international standards, affecting the performance and quality needed for advanced chip manufacturing [23][25]. - The high-precision manufacturing technology for masks is challenging, with reliance on imported materials, which poses risks to supply chains [23][25]. - The lithography equipment market is dominated by foreign companies, particularly in high-end lithography machines like EUV, which are difficult to obtain for domestic manufacturers [23][25]. Group 3: Keynote Speakers and Topics - Notable speakers include Xiao Guilin, Vice President of Hubei Dinglong Holdings, who will discuss the development and application trends of advanced packaging PSPI and bonding adhesives [8][12]. - Other topics include the development of nano-imprint and electron beam technologies, and the challenges of hybrid bonding in advanced packaging [7][12]. - The conference will also explore the domestic production of photoresists and the challenges faced in achieving self-sufficiency [12][23]. Group 4: Conference Goals - The conference aims to foster collaboration between academia, research institutions, and industry to accelerate technological innovation and the transformation of research outcomes into practical applications [25]. - It seeks to build a communication bridge for upstream and downstream enterprises in the industry, promoting resource integration and complementary advantages [25]. - The event will provide a platform for discussing solutions to enhance the competitiveness of the lithography industry as a whole [25].

Core Viewpoint - The 2025 TrendBank Photoresist Industry Conference aims to address the challenges and advancements in photolithography technology, materials, and equipment, focusing on enhancing domestic capabilities and self-sufficiency in the semiconductor industry [24][25][26]. Group 1: Conference Overview - The conference will take place on July 9-10, 2025, at the Sheraton Hotel in Hefei, Anhui, with an expected attendance of 300 participants [19][20]. - The event will feature over 20 speakers from the photolithography industry, covering advanced photolithography technologies, photoresists, and electronic chemicals [17]. - The agenda includes discussions on the latest research progress and application prospects of cutting-edge photolithography technologies such as EUV and electron beam lithography [16]. Group 2: Industry Challenges - The domestic high-end photoresist self-sufficiency rate is low, with significant gaps in R&D and production technology compared to international standards [24]. - The supply of high-purity electronic chemicals is limited, with some products relying on imports [24]. - The manufacturing technology for high-precision masks is complex, and the raw materials for high-end masks are primarily imported, posing supply challenges [24]. Group 3: Company Profile - Jinan Shengquan Group Co., Ltd., established in 1979, specializes in the R&D and application of various plant straw and synthetic resins, covering multiple sectors including biomass refining and electronic chemicals [8]. - The company is recognized as a leader in the global straw green energy comprehensive utilization market, with its furan and phenolic resins leading in production and sales [8]. - The R&D director, Luo Huaxing, has been involved in the development of phenolic resins for photoresists and has achieved significant recognition for innovation in this field [9].

Core Viewpoint - The 2025 TrendBank Lithography Industry Conference aims to address the challenges and advancements in lithography technology, materials, and equipment, fostering collaboration among industry experts and enhancing the competitiveness of the lithography sector in China [11][27][28]. Group 1: Conference Details - The conference will be held on July 9-10, 2025, at the Sheraton Hotel in Hefei, Anhui, with an expected attendance of 300 participants [16][28]. - The event is organized by TrendBank and co-organized by the Shenzhen Semiconductor and Integrated Circuit Industry Alliance [16]. Group 2: Industry Challenges - The lithography industry in China faces significant challenges, including low self-sufficiency in high-end photoresists, technological gaps compared to international standards, and reliance on imports for critical materials and equipment [26][27]. - The high precision required for mask manufacturing and the dominance of foreign companies in high-end lithography machines, such as EUV lithography, pose additional barriers to the development of the domestic semiconductor industry [26]. Group 3: Conference Agenda - The conference will feature discussions on various topics, including high-performance heterogeneous integration technology, low-cost applications of nanoimprint and electron beam technologies, and the development trends of photoresist materials in China [17][18]. - Notable speakers include experts from leading universities and companies, addressing both opportunities and challenges in the lithography field [17][18]. Group 4: Company Overview - TrendBank is a leading industry research and data company in China, providing data, research, consulting, and conference services to support decision-making and business development [32]. - The company collaborates closely with experienced R&D engineers from Korea, Japan, the United States, and domestic firms to offer comprehensive laboratory equipment solutions [2][3].

Core Viewpoint - The 2025 TrendBank Lithography Industry Conference aims to address the challenges and advancements in lithography technology, materials, and equipment, focusing on enhancing domestic capabilities and self-sufficiency in the semiconductor industry [14][23]. Conference Information - The conference will be held on July 9-10, 2025, at the Sheraton Hotel in Hefei, Anhui [13][24]. - It is organized by TrendBank and co-organized by the Shenzhen Semiconductor and Integrated Circuit Industry Alliance [13]. Agenda Highlights - The conference will feature over 20 speakers from the lithography industry, covering advanced lithography technologies, photoresists, wet electronic chemicals, and mask and lithography equipment [15]. - Discussions will include the latest research progress and application prospects of cutting-edge lithography technologies such as EUV, electron beam lithography, and nanoimprint [14]. Industry Challenges - The domestic high-end photoresist supply rate is low, with significant gaps in research and production technology compared to international standards [22]. - The reliance on imports for high-purity and specialty wet electronic chemicals poses supply chain risks [22]. - The high-precision manufacturing technology for masks is challenging, with key raw materials primarily imported [22]. Strategic Importance - The conference aims to foster deep integration of industry, academia, and research, enhancing communication and collaboration among domestic research institutions, universities, and enterprises [23]. - It seeks to build a complete industrial ecosystem to improve the overall competitiveness of the lithography industry [23].

势银研究： 势银产业研究服务 势银数据： 势银数据产品服务 势银咨询： 势银咨询顾问服务 重要会议： 7月9日-10日，2025势银（第五届）光刻产业大会（安徽合肥） 点此报名 添加文末微信，加 光刻胶 群 "宁波膜智信息科技有限公司"为势银（TrendBank）唯一工商注册实体及收款账户 封装材料PSPI（Photosensitive Polyimide，光敏性聚酰亚胺）是一种兼具光敏性和优异物理化 学性能的高分子材料，结合了聚酰亚胺的优良介电性能、机械强度和耐热性，以及光刻胶的感光 性，承担着芯片表面保护、凸块钝化及重布线层绝缘等核心功能。 相较于传统非光敏聚酰亚胺，以PSPI为基质配制成的光刻胶可直接光刻成型，无需复杂的光刻胶 刻蚀和去胶工序，大大简化集成电路的制造工艺，提高光刻胶图形的精度，被广泛应用于半导体 封装、先进封装工艺、OLED显示等领域，具有重要的技术价值和应用前景。 据 势银（TrendBank）统计研究显示：2024年全球封装用PSPI市场规模达4.02亿美元，预计 2030年将达到8.02亿美元 。由于PSPI技术壁垒较高，日美厂商垄断高端市场，主要供应28nm 以下制程，五大头部厂 ...

Core Viewpoint - The article highlights the upcoming "2025 TrendBank Lithography Industry Conference" scheduled for July 9-10, 2025, in Hefei, Anhui, aiming to address challenges and advancements in the lithography technology sector, particularly in semiconductor manufacturing [12][24][25]. Company Overview - Hebei Auge Fluid Equipment Co., Ltd. specializes in the design and manufacturing of various clean mixing tanks, reactors, and system integration technologies, holding multiple certifications and qualifications [2][3]. - The company has been recognized as a high-tech enterprise and possesses various industry certifications, including pressure vessel design and manufacturing licenses [2]. Product Offerings - Auge's main products include clean mixing tanks/reactors, high-purity PFA tanks, EP reactors, heat exchangers, condensers, tubular reactors, and chemical turnover barrels, along with system integration technology design and engineering installation [3][5]. Conference Details - The "2025 TrendBank Lithography Industry Conference" will feature discussions on advanced lithography technologies, challenges in the lithography materials sector, and the development of high-end lithography equipment [15][24]. - The conference aims to foster collaboration among industry experts, researchers, and enterprises to enhance the lithography technology ecosystem and address supply chain challenges in the semiconductor industry [24][25]. Industry Challenges - The lithography industry in China faces significant challenges, including low self-sufficiency in high-end lithography materials, reliance on imports for certain chemicals, and technological gaps in high-precision mask manufacturing and lithography equipment [23][24]. - The geopolitical landscape has heightened the urgency for China to strengthen its capabilities in lithography technology and related industries to ensure supply chain security [24].

"宁波膜智信息科技有限公司"为势银（TrendBank）唯一工商注册实体及收款账户 势银研究： 势银产业研究服务 势银数据： 势银数据产品服务 势银咨询： 势银咨询顾问服务 重要会议： 7月9日-10日，2025势银（第五届）光刻产业大会（安徽合肥） 点此报名 添加文末微信，加 光刻胶 群 天璇新材料 总经理 周宓 确认参加 2025势银（第五届）光刻产业大会， 并作为嘉宾分享 " 纳米压印 光学胶的研发与进展 " 的主题报告 。 得很 居家 宁波天璇新材料科技有限公司 总经理 演讲主题: 纳米压印光学胶的研发与进展 2025势银(第五届)光刻产业大会 扫描二维码报名 0 合肥新站利港喜来登酒店 ⊙ 2025年7月9日-10日 主办方致辞 朱慧 合伙人兼泛半导体事业部总裁 势银 (TrendBank) 周宓， 总经理、博士，2010年 毕业于新加坡国立大学，其后长期服务于世界第一大 化学公司巴斯夫，担任高级研发科学家。现任宁波天璇新材料科技有限公司总经理， 回国后成功入选浙江省高层次人才项目、浙江省钱江人才等多个项目。 周宓博士多年 来持续深耕高性能光电材料领域，发表和授权国际国内专利70余篇，期刊论文10余 ...

Core Viewpoint - The 2025 TrendBank Lithography Industry Conference aims to address the challenges and advancements in lithography technology, materials, and equipment, focusing on enhancing domestic capabilities in the semiconductor industry [21][22]. Group 1: Conference Overview - The conference will take place on July 9-10, 2025, at the Sheraton Hotel in Hefei, Anhui, with an expected attendance of 300 participants [16][21]. - The event will feature over 20 guest speakers discussing various topics related to the lithography industry, including advanced lithography technologies and the development of photolithography materials [14][22]. Group 2: Industry Challenges - The domestic high-end photolithography materials have a low self-sufficiency rate, with significant gaps in research and production technology compared to international standards [21]. - The supply of high-purity and specialized wet electronic chemicals is heavily reliant on imports, posing risks to the supply chain [21]. - The manufacturing technology for high-precision photomasks is complex, with key raw materials also primarily imported, which limits domestic production capabilities [21]. Group 3: Key Topics of Discussion - The conference will cover cutting-edge lithography technologies such as extreme ultraviolet lithography (EUV), electron beam lithography, and nanoimprint lithography, along with their latest research progress and application prospects [13]. - Discussions will also focus on the current state and technological bottlenecks of photolithography materials, including photopolymers and wet electronic chemicals, and strategies for improving domestic production and quality [13][22]. - The event aims to foster collaboration between academia, research institutions, and industry players to accelerate technological innovation and enhance the overall competitiveness of the lithography industry [22].