Core Viewpoint - The 2025 TrendBank (Fifth) Lithography Industry Conference will be held on July 9-10, 2025, in Hefei, focusing on advanced lithography technologies and the challenges faced by the domestic lithography materials industry [14][25]. Group 1: Conference Overview - The conference will feature over 20 speakers from the lithography industry, covering advanced lithography technologies, photoresists, wet electronic chemicals, masks, and lithography equipment [15]. - The event aims to promote deep integration of industry, academia, and research, enhancing communication and collaboration among domestic research institutions, universities, and enterprises [23][24]. Group 2: Industry Challenges - The domestic lithography industry faces significant challenges, including low self-sufficiency rates in high-end photoresists and reliance on imports for key materials and equipment [22]. - The high-precision manufacturing technology for masks is difficult, with major raw materials also being imported, which poses risks to supply stability [22]. Group 3: Conference Details - The conference will take place at the Sheraton Hefei New Station Hotel, with an expected attendance of around 300 participants [16]. - Registration fees are set at RMB 2600 if paid by June 30, and RMB 2800 thereafter, which includes conference materials, meals, and a gala dinner [18].

"宁波膜智信息科技有限公司"为势银（TrendBank）唯一工商注册实体及收款账户 势银研究： 势银产业研究服务 势银数据： 势银数据产品服务 势银咨询： 势银咨询顾问服务 重要会议： 7月9日-10日，2025势银（第五届）光刻产业大会（安徽合肥） 点此报名 添加文末微信，加 光刻胶 群 01 彤程新材 业务情况 彤程新材2024年半导体光刻胶业务实现营业收入同比增长50.43%。ArF光刻胶已通过客户验证并开 始陆续上量产生营收，EBR等产品也开始创收；2024年面板光刻胶业务同比增长26.8%，高分辨率 OLED光刻胶以及AMOLED Touch用低温光刻胶均已实现量产销售。 研发实力 公司半导体光刻胶研发项目近50项，一半项目通过用户验证，部分进入小批量生产阶段。技术研发 方面：KrF光刻胶实现110nm分辨率突破；基于自研分级树脂的I线光刻胶开发成功；同时推出多款 厚膜先进封装用光刻胶。显示面板光刻胶方面，可适用于Array工艺所有Layer需求的4-Mask高感度 光刻胶产品出货持续增加且在不断扩展新客户中。针对AMOLED高感度高分辨率光刻胶正在抓紧 开展测试，预计今年全面量产导入。 02 艾森 ...

势银研究： 势银产业研究服务 势银数据： 势银数据产品服务 势银咨询： 势银咨询顾问服务 重要会议： 7月9日-10日，2025势银（第五届）光刻产业大会（安徽合肥） 点此报名 添加文末微信，加 光刻胶 群 上海市计测院集成电路产业计量检测中心 主任 李春华 确认参加 2025势银（第五届）光刻产业大 会， 并作为嘉宾分享 " 光刻配套试剂等化学品检测与超净实验室运营（拟） " 的主题报告 。 "宁波膜智信息科技有限公司"为势银（TrendBank）唯一工商注册实体及收款账户 人帮眼 李喜华 上海市计量测试技术研究院 集成电路产业计量检测中心主 任兼上海市电子化学品计量检 测平台主管,高级工程师 演讲官题: 光刻配套试剂等化学品检测与 超净实验室运营(W) 2025势银(第五届)光刻产业大会 0 合肥新站利港喜来登酒店 ⊙ 2025年7月9日-10日 李春华， 高级工程师，国家一级注册计量师，现任上海市计测院集成电路产业计量检测 中心主任兼上海市电子化学品计量检测平台主管。担任全国化学标准化技术委员会化学 试剂分会委员，全国半导体设备与材料标准化技术委员会委员，至今已参与起草国家标 准10余项。从事检测分析1 ...

Core Viewpoint - The 2025 TrendBank Lithography Industry Conference aims to address the challenges and advancements in lithography technology, materials, and equipment, focusing on enhancing domestic capabilities and self-sufficiency in the semiconductor industry [12][21]. Conference Overview - The conference will take place on July 9-10, 2025, in Hefei, Anhui, at the Sheraton Hotel [16][20]. - It will feature over 20 industry experts discussing advanced lithography technologies, including EUV, electron beam lithography, and nanoimprint techniques [13][12]. - The agenda includes sessions on lithography materials, chemical products, and equipment, emphasizing the need for domestic production and innovation [12][21]. Keynote Speakers and Topics - Li Jiarong, General Manager of Hangzhou Zhongtai Hydrogen Energy Technology Co., will present on "Application of Lithography Gases and Development of China's Rare Gas Industry" [6][11]. - Other notable speakers include representatives from BOE Technology Group and Nankai University, discussing various aspects of lithography technology and materials [9][10]. Industry Challenges - The domestic lithography industry faces significant challenges, including low self-sufficiency in high-end photoresists and reliance on imports for critical materials and equipment [20][21]. - The conference aims to foster collaboration between academia and industry to address these challenges and promote technological innovation [21][12]. Registration and Participation - Registration fees are set at RMB 2600 before June 30 and RMB 2800 thereafter, which includes conference materials, meals, and a gala dinner [17][16]. - The conference is expected to attract around 300 participants, providing a platform for networking and resource integration within the lithography supply chain [16][21].

"宁波膜智信息科技有限公司"为势银（TrendBank）唯一工商注册实体及收款账户 势银研究： 势银产业研究服务 势银数据： 势银数据产品服务 作 张可利 角江实验室 信息材料与微纳器件制备平台 研究员 演讲主题: 厨合瘦合在异响集成先进封装 中的应用与挑战 2025势银(第五届)光刻产业大会 扫描_维码报名 0 合肥新站利港喜来登酒店 ⊙ 2025年7月9日-10日 势银咨询： 势银咨询顾问服务 重要会议： 7月9日-10日，2025势银（第五届）光刻产业大会（安徽合肥） 点此报名 添加文末微信，加 光刻胶 群 甬江实验室 研究员 张瓦利 确认参加 2025势银（第五届）光刻产业大会， 并作为嘉宾分享 "混合键 合在异构集成先进封装中的应用与挑战" 的主题报告 。 张瓦利，研究员，甬江实验室信息材料与微纳器件制备平台。 甬江实验室 （新材料浙江省实验室）成立于2021年5月，由浙江省科技厅和宁波市政府 共建，具备独立法人资格，位于宁波甬江科创区核心区域，占地600亩，建筑面积89万 平方米。 甬江实验室信息材料与微纳器件制备平台 （简称"微纳平台"）聚焦下一代光电产业发展 需求，以"微纳光学"与"芯片异构集 ...

Core Viewpoint - The 2025 TrendBank Lithography Industry Conference aims to address the challenges and advancements in lithography technology, materials, and equipment, focusing on enhancing domestic capabilities and self-sufficiency in the semiconductor industry [21][22]. Group 1: Conference Overview - The conference will take place on July 9-10, 2025, at the Sheraton Hotel in Hefei, Anhui, with an expected attendance of 300 participants [15][21]. - The agenda includes discussions on advanced lithography technologies, the current state of lithography materials, and the challenges faced in domestic production [13][22]. - Keynote speakers and industry experts will present on various topics, including the latest research in extreme ultraviolet lithography (EUV) and the domestic production of photoresists and wet electronic chemicals [10][14]. Group 2: Industry Challenges - The domestic high-end photoresist supply rate is low, and the technology lags behind international standards, affecting the performance and quality required for advanced chip manufacturing [21][22]. - The reliance on imports for high-purity and specialized wet electronic chemicals poses a supply risk, while the manufacturing of high-precision masks remains a significant challenge [21][22]. - The lithography equipment market is dominated by foreign companies, with domestic manufacturers facing substantial technological and precision gaps [21][22]. Group 3: Company Profile - Jiangsu Jicui Photo-sensitive Electronic Materials Research Institute, established in June 2021, focuses on the R&D and industrialization of photoresist raw materials and related technologies [7][8]. - The company has achieved recognition as a high-tech enterprise and is a member of the "Integrated Circuit Photoresist Industry Innovation Alliance" [8]. - The company has successfully developed several KrF photoresist resins that have passed customer testing and are in small-scale production [8]. Group 4: Conference Highlights - The conference will feature over 20 speakers from the lithography industry, providing insights and fostering interaction across the supply chain [14]. - Three main sessions will cover advanced lithography technologies, photoresists and wet electronic chemicals, and mask and lithography equipment, offering a comprehensive view of the industry [14]. - The event aims to facilitate collaboration between academia, research institutions, and industry players to enhance innovation and technology transfer [22].

"宁波膜智信息科技有限公司"为势银（TrendBank）唯一工商注册实体及收款账户 势银研究： 势银产业研究服务 势银数据： 势银数据产品服务 势银咨询： 势银咨询顾问服务 重要会议： 7月9日-10日，2025势银（第五届）光刻产业大会（安徽合肥） 点此报名 添加文末微信，加 光刻胶 群 在半导体芯片集成高密化和线路精细化上，光刻与刻蚀承担着重要的工艺角色，尤其是在半导体前 道制程中，光刻机与刻蚀机分辨率很大程度上决定了集成电路精细化发展水平。在这里我们重点阐 述光刻产业话题。 | 制程 | 晶圆尺寸 | 金属材料 | 光刻机类型 | | --- | --- | --- | --- | | 0.5µm | 200mm | Al | g-line:436nm | | 0.35µm | 200mm | Al | i-line:365nm | | 0.25µm | 200mm | Al | KrF:248nm(stepper) | | 0.18/0.15µm | 200mm | Al | KrF:248(stepper&scanner) | | 0.13µm | 200/300mm | Al/Cu | ArF: ...

Core Viewpoint - The 2025 TrendBank (Fifth) Lithography Industry Conference aims to address the challenges and advancements in lithography technology, materials, and equipment, focusing on enhancing domestic capabilities and self-sufficiency in the semiconductor industry [21][22][23]. Conference Overview - The conference will take place on July 9-10, 2025, in Hefei, Anhui, at the Sheraton Hotel [14][20]. - It will feature over 20 industry experts discussing advanced lithography technologies, including EUV, electron beam lithography, and nanoimprint techniques [16]. - The event will cover the current state of domestic lithography materials, including photoresists and wet electronic chemicals, and explore the challenges in achieving higher self-sufficiency and quality [15][21]. Keynote Speakers and Topics - Professor Luo Feng from Nankai University will present on "Low-cost multi-scenario application potential of nanoimprint/electron beam/DSA technology direction" [11][12]. - Other notable speakers include representatives from leading companies such as BOE Technology Group and Ningbo Tianxuan New Materials Technology Co., discussing various aspects of lithography technology and materials [11][12]. Industry Challenges - The domestic high-end photoresist supply rate is low, and there is a significant gap in R&D and production technology compared to international standards [21]. - The reliance on imports for high-purity and specialty wet electronic chemicals poses a supply risk [21]. - The high-precision manufacturing of masks and the dominance of foreign companies in high-end lithography machines, such as EUV lithography machines, are critical bottlenecks for the domestic semiconductor industry [21]. Strategic Importance - The conference aims to foster collaboration among academia, research institutions, and industry players to accelerate technological innovation and enhance the competitiveness of the lithography industry [22]. - It will serve as a platform for resource integration and synergy among upstream and downstream enterprises in the lithography supply chain [22].

Core Viewpoint - The 2025 TrendBank (Fifth) Lithography Industry Conference will be held on July 9-10, 2025, in Hefei, focusing on advancements in lithography technology and materials, as well as challenges in the domestic supply chain [2][21]. Summary by Sections Conference Overview - The conference will feature over 20 speakers from various sectors of the lithography industry, including academia and enterprises, discussing advanced lithography technologies and materials [13][21]. - The event aims to enhance collaboration between research institutions, universities, and enterprises to accelerate technological innovation and promote the upgrading of the lithography industry [21][22]. Participating Organizations - Notable participants include: - BOE Technology Group: A leading global semiconductor display product company [3]. - Jiageng Laboratory: Focused on high-end lithography materials and semiconductor cleaning materials [3]. - Bomi Technology: Engaged in the development of photosensitive polyimide and related semiconductor materials [3]. - Xingtai Technology: Specializes in the research and production of high-end lithography resins [3]. - Other participants include universities and research institutes such as Nankai University and Shanghai Institute of Measurement and Testing Technology [3][4]. Conference Agenda - The agenda includes discussions on: - EUV lithography, electron beam lithography, and nanoimprint technologies [12]. - The current state and challenges of domestic lithography materials, including photoresists and wet electronic chemicals [12]. - Key issues in the domestic production of lithography equipment and solutions to enhance self-sufficiency [12]. Key Highlights - The conference will feature three specialized sessions covering advanced lithography technologies, photoresists and wet electronic chemicals, and lithography equipment, providing a comprehensive view of the industry [13][21]. - Academic discussions will be held to establish a theoretical foundation for industry development [14]. Registration and Fees - Registration fees are set at RMB 2600 if paid by June 30, 2025, and RMB 2800 thereafter, which includes access to conference materials and meals [16][15]. Background and Industry Context - The lithography technology is crucial for semiconductor manufacturing, impacting chip performance and production costs [20]. - The domestic lithography industry faces challenges such as low self-sufficiency in high-end photoresists and reliance on imports for critical materials and equipment [20][21].

硅芯科技主要从事新一代2.5D/3D堆叠芯片EDA软件设计，团队致力于新一代2.5D/3D堆叠芯片EDA软 件开发，专注于后端核心实现流程。 硅芯科技自研3Sheng Integration Platform，实现三维堆叠芯片的系统级规划、物理实现与分 析、可测性与可靠性设计等，集成"系统-测试-综合-仿真-验证"五引擎合一，具有统一数据底 座，支持三维异构集成系统的敏捷开发与可定制化的协同设计优化，并在多个功能和性能上具有 独创性。 三维堆叠芯片（2.5D/3D/3.5D/SoW）包含多个堆叠芯片（Stacked Die），这些Die通过中介 层上特殊过孔（via）或互连凸块（bump）来实现所需的连接。然而，微凸块与Die间互连、 硅通孔和相关晶圆薄化以及无源中介层的键合，均是不可逆过程，相较传统SoC开发研制，多 样化封装测试和新的结构流程给复合堆叠带来新的测试流程和可测性需求。 以下文章来源于硅芯科技 ，作者Robin 硅芯科技 . 硅 芯 科 技 的 3Sheng Integration EDA 是 如 何 帮 助 3DIC 设 计 ， 在 新 的 测 试 流 程 的 键 合 （bonding）前后 ...